WIPO PUBLISHES PATENT OF GIGAPHOTON FOR "TARGET MATERIAL, MATERIAL PROCESSING DEVICE, MATERIAL PROCESSING METHOD, MATERIAL PRODUCTION METHOD AND PROGRAM" (JAPANESE INVENTORS)

GENEVA, April 25 -- Publication No. WO/2016/059674 was published on April 21.

Title of the invention: "TARGET MATERIAL, MATERIAL PROCESSING DEVICE, MATERIAL PROCESSING METHOD, MATERIAL PRODUCTION METHOD AND PROGRAM."

Applicants: GIGAPHOTON INC. (JP).

Inventors: Yutaka Shiraishi (JP), Tsukasa Hori (JP) and Fumio Iwamoto (JP).

According to the abstract* posted by the World Intellectual Property Organization: "In one aspect of this invention, the target material (271) is used for a target generation device (26, 120, 140, 51, 112) of an extreme UV generation device (1), wherein the concentration of dissolved oxygen may be less than or equal to the oxygen saturation concentration at a first temperature (Top), which is the temperature of the target material being delivered by the target generation device. In another aspect of the invention, the material processing device may comprise a tank unit (260) for containing the target material, a temperature changing device (140) for changing the temperature of the target material inside the tank unit, and a control unit (201/301) for controlling the temperature changing device so that the target material (273) inside the tank unit is melted at a second temperature (Td) and then solidified, the second temperature (Td) being less than or equal to the first temperature which is the temperature of the target material being delivered by the target generation device of the extreme UV generation device."

The patent was filed on Oct. 14, 2014 under Application No. PCT/JP2014/077339.

*For further information, including images, charts and tables, please visit:

http://www.wipo.int/patentscope/search/en/detail.jsf?docId=WO2016059674

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