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High-pressure Gas Activation for Amorphous Indium-Gallium-Zinc-Oxide Thin-Film Transistors at 100 °C
Kim, Won-gi; Tak, Young Jun; Du Ahn, Byung; Jung, Tae Soo; Chung, Kwun-bum
; et al.
Scientific Reports (Nature Publisher Group); London Vol. 6, (Mar 2016): 23039.
DOI:10.1038/srep23039
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