Abstract

Optoelectronic memory plays a vital role in modern semiconductor industry. The fast emerging requirements for device miniaturization and structural flexibility have diverted research interest to two-dimensional thin layered materials. Here, we report a multibit nonvolatile optoelectronic memory based on a heterostructure of monolayer tungsten diselenide and few-layer hexagonal boron nitride. The tungsten diselenide/boron nitride memory exhibits a memory switching ratio approximately 1.1 × 106, which ensures over 128 (7 bit) distinct storage states. The memory demonstrates robustness with retention time over 4.5 × 104 s. Moreover, the ability of broadband spectrum distinction enables its application in filter-free color image sensor. This concept is further validated through the realization of integrated tungsten diselenide/boron nitride pixel matrix which captured a specific image recording the three primary colors (red, green, and blue). The heterostructure architecture is also applicable to other two-dimensional materials, which is confirmed by the realization of black phosphorus/boron nitride optoelectronic memory.

Details

Title
Two-dimensional multibit optoelectronic memory with broadband spectrum distinction
Author
Du, Xiang 1 ; Liu, Tao 2 ; Xu, Jilian 3 ; Tan, Jun Y 4 ; Hu, Zehua 2 ; Lei, Bo 2 ; Zheng, Yue 2 ; Wu, Jing 5 ; Castro Neto, A H 2   VIAFID ORCID Logo  ; Liu, Lei 3 ; Chen, Wei 6 

 Department of Chemistry, National University of Singapore, Singapore, Singapore; Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, Singapore, Singapore 
 Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, Singapore, Singapore; Department of Physics, National University of Singapore, Singapore, Singapore 
 State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, People’s Republic of China 
 Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, Singapore, Singapore 
 Institute of Materials Research and Engineering (IMRE), Singapore, Singapore 
 Department of Chemistry, National University of Singapore, Singapore, Singapore; Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, Singapore, Singapore; Department of Physics, National University of Singapore, Singapore, Singapore; National University of Singapore (Suzhou) Research Institute, Jiang Su, China 
Pages
1-8
Publication year
2018
Publication date
Jul 2018
Publisher
Nature Publishing Group
e-ISSN
20411723
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2077457616
Copyright
© 2018. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.