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Abstract
Atomically thin hexagonal boron nitride (h-BN) is often regarded as an elastic film that is impermeable to gases. The high stabilities in thermal and chemical properties allow h-BN to serve as a gas barrier under extreme conditions. Here, we demonstrate the isolation of hydrogen in bubbles of h-BN via plasma treatment. Detailed characterizations reveal that the substrates do not show chemical change after treatment. The bubbles are found to withstand thermal treatment in air, even at 800 °C. Scanning transmission electron microscopy investigation shows that the h-BN multilayer has a unique aligned porous stacking nature, which is essential for the character of being transparent to atomic hydrogen but impermeable to hydrogen molecules. In addition, we successfully demonstrated the extraction of hydrogen gases from gaseous compounds or mixtures containing hydrogen element. The successful production of hydrogen bubbles on h-BN flakes has potential for further application in nano/micro-electromechanical systems and hydrogen storage.
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1 School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China; State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China; CAS Center for Excellence in Superconducting Electronics (CENSE), Shanghai, China
2 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China; CAS Center for Excellence in Superconducting Electronics (CENSE), Shanghai, China; Graduate University of the Chinese Academy of Sciences, Beijing, China
3 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China; CAS Center for Excellence in Superconducting Electronics (CENSE), Shanghai, China
4 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China; CAS Center for Excellence in Superconducting Electronics (CENSE), Shanghai, China; School of Physical Science and Technology, ShanghaiTech University, Shanghai, China
5 Department of Lithospheric Research, University of Vienna, Vienna, Austria; Electron Microscopy for Materials Research (EMAT), University Antwerpen, Antwerpen, Belgium
6 Faculty of Physics, University of Vienna, Wien, Austria; School of Chemistry, Trinity College Dublin, Dublin 2, Ireland; Advanced Microscopy Laboratory, Centre for Research on Adaptive Nanostructures and Nanodevices, Dublin 2, Ireland
7 Faculty of Physics, University of Vienna, Wien, Austria; Institute for Applied Physics and Natural and Medical Sciences Institute, University of Tübingen, Tübingen, Germany
8 National Institute for Materials Science, Tsukuba, Japan
9 Department of Physics, Southeast University, Nanjing, China
10 School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China
11 State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China; CAS Center for Excellence in Superconducting Electronics (CENSE), Shanghai, China; Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, P.R. China