Abstract

We report on a novel implementation of the cryo-etching method, which enabled us to fabricate low-roughness hBN-encapsulated graphene nanoconstrictions with unprecedented control of the structure edges; the typical edge roughness is on the order of a few nanometers. We characterized the system by atomic force microscopy and used the measured parameters of the edge geometry in numerical simulations of the system conductance, which agree quantitatively with our low temperature transport measurements. The quality of our devices is confirmed by the observation of well defined quantized 2e2/h conductance steps at zero magnetic field. To the best of our knowledge, such an observation reports the clearest conductance quantization in physically etched graphene nanoconstrictions. The fabrication of such high quality systems and the scalability of the cryo-etching method opens a novel promising possibility of producing more complex truly-ballistic devices based on graphene.

Details

Title
Quantum nanoconstrictions fabricated by cryo-etching in encapsulated graphene
Author
Clericò, V 1 ; Delgado-Notario, J A 1 ; Saiz-Bretín, M 2 ; Malyshev, A V 3 ; Meziani, Y M 1 ; Hidalgo, P 2 ; Méndez, B 2 ; Amado, M 1 ; Domínguez-Adame, F 2   VIAFID ORCID Logo  ; Diez, E 1   VIAFID ORCID Logo 

 Group of Nanotechnology, USAL-NANOLAB, Universidad de Salamanca, Salamanca, Spain 
 Departamento de Física de Materiales, Universidad Complutense, Madrid, Spain 
 Departamento de Física de Materiales, Universidad Complutense, Madrid, Spain; Ioffe Physical-Technical Institute, St. Petersburg, Russia 
Pages
1-7
Publication year
2019
Publication date
Sep 2019
Publisher
Nature Publishing Group
e-ISSN
20452322
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2293851223
Copyright
© 2019. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.