Abstract

This review describes a series of representative synthesis processes, which have been developed in the last two decades to prepare silicon quantum dots (QDs). The methods include both top-down and bottom-up approaches, and their methodological advantages and disadvantages are presented. Considerable efforts in surface functionalization of QDs have categorized it into (i) a two-step process and (ii) in situ surface derivatization. Photophysical properties of QDs are summarized to highlight the continuous tuning of photoluminescence color from the near-UV through visible to the near-IR range. The emission features strongly depend on the silicon nanostructures including QD surface configurations. Possible mechanisms of photoluminescence have been summarized to ascertain the future challenges toward industrial use of silicon-based light emitters.

Details

Title
Colloidal silicon quantum dots: synthesis and luminescence tuning from the near-UV to the near-IR range
Author
Ghosh, Batu 1 ; Shirahata, Naoto 2 

 International Center for Materials Nanoarchitectonics (WPI-MANA), 1-1 Namiki, Tsukuba, 305-0044, Japan 
 International Center for Materials Nanoarchitectonics (WPI-MANA), 1-1 Namiki, Tsukuba, 305-0044, Japan; National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, 305-0047, Japan; PRESTO, Japan Science and Technology Agency (JST), 4-1-8 Honcho Kawaguchi, Saitama, 332-0012, Japan 
Publication year
2014
Publication date
Feb 2014
Publisher
Taylor & Francis Ltd.
ISSN
14686996
e-ISSN
18785514
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2332063475
Copyright
© 2014 National Institute for Materials Science. This work is licensed under the Creative Commons Attribution License http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.