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Abstract
This review describes a series of representative synthesis processes, which have been developed in the last two decades to prepare silicon quantum dots (QDs). The methods include both top-down and bottom-up approaches, and their methodological advantages and disadvantages are presented. Considerable efforts in surface functionalization of QDs have categorized it into (i) a two-step process and (ii) in situ surface derivatization. Photophysical properties of QDs are summarized to highlight the continuous tuning of photoluminescence color from the near-UV through visible to the near-IR range. The emission features strongly depend on the silicon nanostructures including QD surface configurations. Possible mechanisms of photoluminescence have been summarized to ascertain the future challenges toward industrial use of silicon-based light emitters.
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1 International Center for Materials Nanoarchitectonics (WPI-MANA), 1-1 Namiki, Tsukuba, 305-0044, Japan
2 International Center for Materials Nanoarchitectonics (WPI-MANA), 1-1 Namiki, Tsukuba, 305-0044, Japan; National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, 305-0047, Japan; PRESTO, Japan Science and Technology Agency (JST), 4-1-8 Honcho Kawaguchi, Saitama, 332-0012, Japan