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Abstract
The heterostructure of monolayer transition metal dichalcogenides (TMDCs) provides a unique platform to manipulate exciton dynamics. The ultrafast carrier transfer across the van der Waals interface of the TMDC hetero-bilayer can efficiently separate electrons and holes in the intralayer excitons with a type II alignment, but it will funnel excitons into one layer with a type I alignment. In this work, we demonstrate the reversible switch from exciton dissociation to exciton funneling in a MoSe2/WS2 heterostructure, which manifests itself as the photoluminescence (PL) quenching to PL enhancement transition. This transition was realized through effectively controlling the quantum capacitance of both MoSe2 and WS2 layers with gating. PL excitation spectroscopy study unveils that PL enhancement arises from the blockage of the optically excited electron transfer from MoSe2 to WS2. Our work demonstrates electrical control of photoexcited carrier transfer across the van der Waals interface, the understanding of which promises applications in quantum optoelectronics.
The ultrafast carrier dynamics across the van der Waals interface of transition metal dichalcogenide heterostructures govern the formation and funnelling of excitons. Here, the authors demonstrate a reversible switch from exciton dissociation to exciton funnelling in a MoSe2/WS2 heterostructure, which manifests itself as a photoluminescence quenching-to-enhancement transition.
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1 Rensselaer Polytechnic Institute, Department of Chemical and Biological Engineering, Troy, USA (GRID:grid.33647.35) (ISNI:0000 0001 2160 9198); Nanjing University, National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, and School of Physics, Nanjing, P. R. China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X)
2 Rensselaer Polytechnic Institute, Department of Chemical and Biological Engineering, Troy, USA (GRID:grid.33647.35) (ISNI:0000 0001 2160 9198)
3 Cornell University, Kavli Institute at Cornell for Nanoscale Science, Ithaca, USA (GRID:grid.5386.8) (ISNI:000000041936877X)
4 National Institute for Materials Science, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
5 Nanjing University, National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, and School of Physics, Nanjing, P. R. China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X)
6 Rensselaer Polytechnic Institute, Department of Chemical and Biological Engineering, Troy, USA (GRID:grid.33647.35) (ISNI:0000 0001 2160 9198); Rensselaer Polytechnic Institute, Department of Electrical Computer & Systems Engineering, Troy, USA (GRID:grid.33647.35) (ISNI:0000 0001 2160 9198)