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1. Introduction
There is an increasing need of E-band technology for future 5G network infrastructure, such as wireless backhaul. In wireless backhaul systems, highly directional antennas are employed at both transmitter and receiver sides to compensate for the path loss [1, 2]. For example, FCC Part 101 Rules [3] require a minimum antenna gain of 43 dBi to ensure the E-band radio equipment transmitting “pencil beams” to ease interference analysis and spatial coordination of links. Nevertheless, for a multi-Gbps link exceeding multikilometer distance, a watt-level power amplifier (PA) is required to ensure 99.99% weather availability worldwide [1, 2]. Such output power (
Although the ever-increasing speed of MOS transistors provides new opportunities to mm-Wave designers, the low breakdown voltage limits the output power of E-band CMOS PAs to about 0.1 W [2, 4, 5]. The work in [6] demonstrated an E-band SiGe PA with 27.3 dBm
In this paper, we report a fully integrated E-band PA in 100 nm InGaAs pHEMT technology. Circuit optimizations have been applied to active device, unit PA, layout floorplan, and power combining structures to enhance the gain, output power, efficiency, and stability. The proposed 5 mm2 PA demonstrates a measured power gain of 20.6 dB and an output power of 26.5 dBm with 17.9% PAE. Section 2 details the circuit optimizations regarding the transistor biasing, amplifier stage, and power combining structure. Section 3 shows the measurement results with the conclusion given in Section 4.
2. Design Considerations and Circuit Implementation
The power amplifier prototype was designed in a commercial 100 nm InGaAs pHEMT process (
2.1. Transistor Design: Optimum Biasing
In this work, the transistor’s biasing voltages are optimized based on the following PA figure-of-merit (FOM), given by
[figures omitted; refer to PDF]
Besides, an important feature for the 50 × 4 µm transistor under such biasing configuration is that the gain match and power match can be nearly achieved simultaneously, which significantly reduces the design efforts. Note that though 25 × 4 µm transistor shows relatively high maximum small-signal gain, it is potentially unstable at E-band and shows 3 dB lower
2.2. Unit PA Design: Gain, Power, and Stability
Using the optimum device size and bias configurations, a fully integrated unit PA is designed, as shown in Figure 2, where the details of the device parameters are also summarized. The unit PA consists of four stages to achieve more than 20 dB power gain and thus relax the input power requirement. To provide sufficient driving power and in order not to saturate prior to the output stage, the total transistor width of three driver stages is scaled down by a factor of two progressively. A 4-way zero-degree transmission-line (T-line) combiner [11] is employed to sum up
As the transistor has much higher power gain at low frequencies, the stability there becomes a big concern. Simulation predicts that the unit PA is potentially unstable in the range of 25 GHz. To tackle this,
2.3. Power Enhancement: Half-Wavelength T-Line Combiner
To further enhance the output power, the complete PA combines
3. Measurement Results
The PA prototype is fabricated in a 100 nm InGaAs pHEMT process. The chip micrograph is shown in Figure 4. Including RF and dc pads, the chip occupies an area of 5 mm2. Measurements are performed on a high-frequency probe station. The input and output RF pads are accessed by GSG probes while dc pads are wire-bonded to a PCB. The supply voltage for the PA is 3 V.
[figure omitted; refer to PDF]Figure 5 shows the measured S-parameters. The PA achieves a peak
[figures omitted; refer to PDF]
[figure omitted; refer to PDF]Table 1 compares the PA prototype to the state-of-the-art E-band PAs in GaAs, InP, SiGe, and CMOS. Albeit different technologies used, it can be seen that high output power will lead to relatively low efficiency owing to the loss in the power combining network. The work [6] in 250 nm InP with
Table 1
Performance summary and comparison.
| Technology | | Frequency (GHz) | Gain (dB) | | | |
| This work | 100 nm GaAs | 3.0 | 74 | 20.8 | 26.5 | 17.9 |
| [8] | 100 nm GaAs | 4.0 | 83 | 15.0/18.71 | 28.5/26.51 | N/A/15.01 |
| [9] | 100 nm GaAs | 3.5 | 81 | 25.0 | 20.02 | N/A |
| [10] | 100 nm GaAs | 4.0 | 76 | 15.0 | 23.02 | 8.02 |
| [7] | 140 nm GaN | 14.0 | 93.5 | 16.3 | 33.3 | 19.0 |
| [13] | 250 nm InP | 2.5 | 76 | 15.5 | 26.4 | 26.9 |
| [14] | 250 nm InP | 2.5 | 81 | 22.0 | 21.1 | 40.0 |
| [6] | 90 nm SiGe | 1.8 | 76 | 19.3 | 25.03 | 9.03 |
| [15] | 130 nm SiGe | 2.5 | 84 | 27.0 | 18.02 | 9.02 |
| [2] | 40 nm CMOS | 0.9 | 78 | 18.1 | 20.3 | 22.3 |
| [4] | 40 nm CMOS | 1.8 | 73 | 25.3 | 21.5 | 16.5 |
| [5] | 65 nm CMOS | 1.0 | 79 | 24.2 | 19.0 | 18.5 |
4. Conclusion
An E-band PA has been implemented in 100 nm InGaAs pHEMT process. To enhance the single-stage amplifier performance, device size and biasing conditions are fine tuned. A 4-way zero-degree combiner and a 2-way λ/2 combiner are used to improve the output power. Attention has been paid to the PA stability in order to ensure no oscillations appearing from dc to the operating frequencies. The 5 mm2 PA achieves an output power of 0.45 W with 17.9% PAE at 74 GHz. For future work, improvement can be done to reduce the insertion loss of the output combiner and thus further enhance the output power and efficiency. A highly efficient 16-way power combiner can also be investigated to double the output power. At E-band, the GaAs PA outperforms the CMOS PA regarding the output power while it achieves low cost, high yield, and easy foundry access when compared to InP and GaN PAs. Therefore, GaAs PA provides attractive solutions for future long-haul point-to-point communications at E-band.
Conflicts of Interest
The authors declare that they have no conflicts of interest.
Acknowledgments
This work is partly funded by the National Natural Science Foundation of China (no. 61674035), the Natural Science Foundation of Jiangsu Province (no. BK20160690), and the Fundamental Research Funds for the Central Universities.
[1] J. Wells, Multigigabit Microwave and Millimeter-Wave Wireless Communications, 2010.
[2] D. Zhao, P. Reynaert, "An E-band power amplifier with broadband parallel-series power combiner in 40-nm CMOS," IEEE Transactions on Microwave Theory and Techniques, vol. 63 no. 2, pp. 683-690, DOI: 10.1109/TMTT.2014.2379277, 2015.
[3] FCC, "Fixed Microwave Services," . https://www.ecfr.gov/cgi-bin/text-idx?SID=c7ae99179c50117778ff4dfb6787b0fc&mc=true&node=pt47.5.101&rgn=div5#se47.5.101_1115
[4] D. Zhao, P. Reynaert, "A 40-nm cmos E-band 4-way power amplifier with neutralized bootstrapped cascode amplifier and optimum passive circuits," IEEE Transactions on Microwave Theory and Techniques, vol. 63 no. 12, pp. 4083-4089, DOI: 10.1109/TMTT.2015.2496341, 2015.
[5] K.-Y. Wang, T.-Y. Chang, C.-K. Wang, "A 1V 19.3dBm 79GHz power amplifier in 65nm CMOS," Proceedings of the 59th International Solid-State Circuits Conference (ISSCC '12), pp. 260-261, DOI: 10.1109/ISSCC.2012.6177001, .
[6] H.-C. Lin, G. M. Rebeiz, "A 70-80-GHz sige amplifier with peak output power of 27.3 dBm," IEEE Transactions on Microwave Theory and Techniques, vol. 64 no. 7, pp. 2039-2049, DOI: 10.1109/TMTT.2016.2574863, 2016.
[7] M. Micovic, A. Kurdoghlian, A. Margomenos, D. F. Brown, K. Shinohara, S. Burnham, I. Milosavljevic, R. Bowen, A. J. Williams, P. Hashimoto, R. Grabar, C. Butler, A. Schmitz, P. J. Willadsen, D. H. Chow, "92-96 GHz GaN power amplifiers," Proceedings of the IEEE MTT-S International Microwave Symposium (IMS '12), .
[8] E. Camargo, J. Schellenberg, L. Bui, N. Estella, "Power GaAs MMICs for E-band communications applications," Proceedings of the 2014 IEEE MTT-S International Microwave Symposium (IMS '14),DOI: 10.1109/MWSYM.2014.6848537, .
[9] F. D. Canales, M. Abbasi, "A 75-90 GHz high linearity MMIC power amplifier with integrated output power detector," Proceedings of the 2013 IEEE MTT-S International Microwave Symposium Digest (MTT '13),DOI: 10.1109/MWSYM.2013.6697600, .
[10] M. C. Rodriguez, J. Tarazi, A. Dadello, E. R. O. Convert, M. G. McCulloch, S. J. Mahon, S. Hwang, R. G. Mould, A. P. Fattorini, A. C. Young, J. T. Harvey, A. E. Parker, M. C. Heimlich, W.-K. Wang, "Full ETSI E-band doubler, quadrupler and 24 dBm power amplifier," Proceedings of the 2012 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS '12),DOI: 10.1109/CSICS.2012.6340084, .
[11] W. Tai, L. R. Carley, D. S. Ricketts, "A 0.7W fully integrated 42GHz power amplifier with 10% PAE in 0.13 μ m SiGe BiCMOS," Proceedings of the 2013 60th IEEE International Solid-State Circuits Conference (ISSCC '13), pp. 142-143, DOI: 10.1109/ISSCC.2013.6487673, .
[12] S. Cripps, RF Power Amplifier for Wireless Communications (Chapter 13.4 Multistage PA Design), 2006.
[13] Z. Griffith, M. Urteaga, P. Rowell, R. Pierson, "340-440mW Broadband, High-Efficiency E-Band PA's in InP HBT," Proceedings of the 37th IEEE International Symposium on Workload Characterization, (CSICS '15),DOI: 10.1109/CSICS.2015.7314462, .
[14] Z. Griffith, M. Urteaga, P. Rowell, R. Pierson, "71-95 GHz (23-40% PAE) and 96-120 GHz (19-22% PAE) high efficiency 100-130 mW power amplifiers in InP HBT," Proceedings of the 2016 IEEE MTT-S International Microwave Symposium (IMS '16),DOI: 10.1109/MWSYM.2016.7540041, .
[15] Y. Zhao, J. R. Long, "A Wideband, dual-path, millimeter-wave power amplifier with 20 dBm output power and PAE above 15% in 130 nm SiGe-BiCMOS," IEEE Journal of Solid-State Circuits, vol. 47 no. 9, pp. 1981-1997, DOI: 10.1109/JSSC.2012.2201275, 2012.
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Copyright © 2018 Dixian Zhao and Yongran Yi. This work is licensed under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.
Abstract
This paper describes a fully integrated power amplifier (PA) in 100 nm InGaAs pHEMT process for E-band point-to-point communications. The device size and biasing conditions are optimized to enhance the overall performance at millimeter-wave frequencies. The complete PA consists of two unit PAs and each unit PA has four stages to improve the gain while ensuring stability from dc to the operating frequencies. A 4-way zero-degree combiner (in the unit PA) and a 2-way λ/2 combiner are used to boost the output power. Occupying 5 mm2, the proposed PA achieves an output power of 0.45 W with 17.9% PAE at 74 GHz.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer





