It appears you don't have support to open PDFs in this web browser. To view this file, Open with your PDF reader
Abstract
In this study, surface plasmon resonance (SPR) wavelength shifts due to molecular electronic absorptions in the far-ultraviolet (FUV, < 200 nm) and deep-ultraviolet (DUV, < 300 nm) regions were investigated by attenuated total reflectance (ATR) spectroscopy. Due to the strong absorption in the DUV region, N,N-dimethylformamide (DMF) significantly increased the SPR wavelength shift of Al film. On the other hand, no such shift enhancement was observed in the visible region for Au film because DMF does not have absorbance compared to non-absorbing materials such as water and alcohols. The enhanced SPR wavelength shift, caused by the overlap between SPR and molecular resonance wavelengths in FUV-DUV region, is expected to result in high sensitivity for resonant materials.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer
Details
1 Graduate School of Engineering Science, Osaka University, Toyonaka, Japan (GRID:grid.136593.b) (ISNI:0000 0004 0373 3971)
2 Institute of Industrial Science, the University of Tokyo, Meguro, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X)
3 School of Science and Technology, Kwansei Gakuin University, Sanda, Japan (GRID:grid.258777.8) (ISNI:0000 0001 2295 9421)
4 Research Institute of Electronics, Shizuoka University, Hamamatsu, Japan (GRID:grid.263536.7) (ISNI:0000 0001 0656 4913)