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Abstract
A small Be ion dose of 5 נ1014 cm−2 was implanted in a 2 μm thick GaN epilayer at an energy of 50 keV. The sample was characterized by high-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy techniques after a post-implantation rapid thermal annealing (RTA) treatment. The HRTEM images show the crystallographic (1 1 0) and (0 0 2) planes of β-Be3N2. Two characteristic parallelograms drawn in Fast Fourier transform (FFT) image support the formation of β-Be3N2 nanocrystallites in RTA treated sample. Two Raman peaks at 168 and 199 cm−1 are observed in the Raman spectrum of the sample that are assigned to β-Be3N2 on the basis of group theory and HRTEM data. The Raman peak at 168 cm−1 is found close to the K point in the first Brillouin zone of β-Be3N2 while the peak at 199 cm−1 is assigned as a combination mode of the fundamental Raman modes of β-Be3N2.
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Details

1 Research Center for Optoelectronic Materials and Devices, School of Physical Science & Technology, Guangxi University, 530004 Nanning, People’s Republic of China
2 Research Center for Optoelectronic Materials and Devices, School of Physical Science & Technology, Guangxi University, 530004 Nanning, People’s Republic of China; Guangxi Key Laboratory of Processing for Non-ferrous Metallic and Featured Materials, 530004 Nanning, People’s Republic of China