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Abstract
The performance of perovskite photovoltaics is fundamentally impeded by the presence of undesirable defects that contribute to non-radiative losses within the devices. Although mitigating these losses has been extensively reported by numerous passivation strategies, a detailed understanding of loss origins within the devices remains elusive. Here, we demonstrate that the defect capturing probability estimated by the capture cross-section is decreased by varying the dielectric response, producing the dielectric screening effect in the perovskite. The resulting perovskites also show reduced surface recombination and a weaker electron-phonon coupling. All of these boost the power conversion efficiency to 22.3% for an inverted perovskite photovoltaic device with a high open-circuit voltage of 1.25 V and a low voltage deficit of 0.37 V (a bandgap ~1.62 eV). Our results provide not only an in-depth understanding of the carrier capture processes in perovskites, but also a promising pathway for realizing highly efficient devices via dielectric regulation.
Performance of perovskite photovoltaics is greatly affected by undesirable defects that contribute to non-radiative losses. Here, the authors mitigate these losses by doping perovskite with KI to alter the dielectric response, thus defect capturing probability, resulting in inverted device with PCE of 22.3% and low voltage loss.
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1 State Key Laboratory for Artificial Microstructure and Mesoscopic Physics, School of Physics, Frontiers Science Center for Nano-optoelectronics & Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, China (GRID:grid.11135.37) (ISNI:0000 0001 2256 9319)
2 State Key Laboratory for Artificial Microstructure and Mesoscopic Physics, School of Physics, Frontiers Science Center for Nano-optoelectronics & Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, China (GRID:grid.11135.37) (ISNI:0000 0001 2256 9319); Princeton University, Department of Electrical Engineering, Princeton, USA (GRID:grid.16750.35) (ISNI:0000 0001 2097 5006)
3 State Key Laboratory for Artificial Microstructure and Mesoscopic Physics, School of Physics, Frontiers Science Center for Nano-optoelectronics & Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, China (GRID:grid.11135.37) (ISNI:0000 0001 2256 9319); School of Microelectronics, Southern University of Science and Technology, Shenzhen, China (GRID:grid.263817.9)
4 Polymer Science and Engineering Department, University of Massachusetts, Amherst, USA (GRID:grid.266683.f) (ISNI:0000 0001 2184 9220); Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, USA (GRID:grid.184769.5) (ISNI:0000 0001 2231 4551)
5 National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, USA (GRID:grid.184769.5) (ISNI:0000 0001 2231 4551)
6 School of Microelectronics, Southern University of Science and Technology, Shenzhen, China (GRID:grid.263817.9)
7 State Key Laboratory for Artificial Microstructure and Mesoscopic Physics, School of Physics, Frontiers Science Center for Nano-optoelectronics & Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, China (GRID:grid.11135.37) (ISNI:0000 0001 2256 9319); Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, China (GRID:grid.163032.5) (ISNI:0000 0004 1760 2008); Peking University Yangtze Delta Institute of Optoelectronics, Nantong, China (GRID:grid.163032.5)
8 Advanced Technology Institute, University of Surrey, Guildford, UK (GRID:grid.5475.3) (ISNI:0000 0004 0407 4824); State Centre for International Cooperation on Designer Low-Carbon and Environmental Material (SCICDLCEM), School of Materials Science and Engineering, Zhengzhou University, Zhengzhou, China (GRID:grid.207374.5) (ISNI:0000 0001 2189 3846)