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Abstract
Magnetostrictive materials transduce magnetic and mechanical energies and when combined with piezoelectric elements, evoke magnetoelectric transduction for high-sensitivity magnetic field sensors and energy-efficient beyond-CMOS technologies. The dearth of ductile, rare-earth-free materials with high magnetostrictive coefficients motivates the discovery of superior materials. Fe1−xGax alloys are amongst the highest performing rare-earth-free magnetostrictive materials; however, magnetostriction becomes sharply suppressed beyond x = 19% due to the formation of a parasitic ordered intermetallic phase. Here, we harness epitaxy to extend the stability of the BCC Fe1−xGax alloy to gallium compositions as high as x = 30% and in so doing dramatically boost the magnetostriction by as much as 10x relative to the bulk and 2x larger than canonical rare-earth based magnetostrictors. A Fe1−xGax − [Pb(Mg1/3Nb2/3)O3]0.7−[PbTiO3]0.3 (PMN-PT) composite magnetoelectric shows robust 90° electrical switching of magnetic anisotropy and a converse magnetoelectric coefficient of 2.0 × 10−5 s m−1. When optimally scaled, this high coefficient implies stable switching at ~80 aJ per bit.
In this work, Meisenheimer et al. use careful epitaxial growth of FeGa thin films to achieve a metastable state with remarkably high magetostrictive coefficients. Materials with strong magnetostrictive properties are vital components in magnetoelectric multiferroic heterostructures, with considerable potential for use a variety of technologies.
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1 University of Michigan, Department of Materials Science and Engineering, Ann Arbor, USA (GRID:grid.214458.e) (ISNI:0000000086837370)
2 Cornell University, Department of Materials Science and Engineering, Ithaca, USA (GRID:grid.5386.8) (ISNI:000000041936877X)
3 University at Buffalo - The State University of New York, Department of Materials Design and Innovation, Buffalo, USA (GRID:grid.273335.3) (ISNI:0000 0004 1936 9887)
4 University of Wisconsin-Madison, Department of Materials Science and Engineering, Madison, USA (GRID:grid.14003.36) (ISNI:0000 0001 2167 3675)
5 University of California, Department of Electrical Engineering and Computer Sciences, Berkeley, USA (GRID:grid.47840.3f) (ISNI:0000 0001 2181 7878)
6 University of Michigan, Department of Physics, Ann Arbor, USA (GRID:grid.214458.e) (ISNI:0000000086837370)
7 Purdue University, OxideMEMS Lab, West Lafayette, USA (GRID:grid.169077.e) (ISNI:0000 0004 1937 2197)
8 University of California, Department of Materials Science and Engineering, Berkeley, USA (GRID:grid.47840.3f) (ISNI:0000 0001 2181 7878)
9 Cornell University, School of Applied and Engineering Physics, Ithaca, USA (GRID:grid.5386.8) (ISNI:000000041936877X)
10 Peter Grünberg Institute (PGI-9) and JARA Fundamentals of Future Information Technology, Forschungszentrum Jülich GmbH, Jülich, Germany (GRID:grid.8385.6) (ISNI:0000 0001 2297 375X)
11 University of Michigan, Michigan Center for Materials Characterization, Ann Arbor, USA (GRID:grid.214458.e) (ISNI:0000000086837370)
12 Components Research, Intel Corporation, Hillsboro, USA (GRID:grid.419318.6) (ISNI:0000 0004 1217 7655)
13 Penn State University, Department of Materials Science and Engineering, State College, USA (GRID:grid.29857.31) (ISNI:0000 0001 2097 4281)
14 University of California, Department of Materials Science and Engineering, Berkeley, USA (GRID:grid.47840.3f) (ISNI:0000 0001 2181 7878); Lawrence Berkeley National Laboratory, Materials Sciences Division, CA, USA (GRID:grid.184769.5) (ISNI:0000 0001 2231 4551); University of California, Department of Physics, Berkeley, USA (GRID:grid.47840.3f) (ISNI:0000 0001 2181 7878)
15 Cornell University, Department of Materials Science and Engineering, Ithaca, USA (GRID:grid.5386.8) (ISNI:000000041936877X); Kavli Institute at Cornell for Nanoscale Science, Ithaca, USA (GRID:grid.5386.8) (ISNI:000000041936877X); Leibniz-Institut für Kristallzüchtung, Berlin, Germany (GRID:grid.461795.8) (ISNI:0000 0004 0493 6586)