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© 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix “Cryo” is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50 °C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO)6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments.

Details

Title
Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions
Author
De Teresa, José María 1   VIAFID ORCID Logo  ; Orús, Pablo 2 ; Córdoba, Rosa 3 ; Philipp, Patrick 4   VIAFID ORCID Logo 

 Instituto de Ciencia de Materiales de Aragón (ICMA, CSIC-Universidad de Zaragoza) and Departamento de Física de la Materia Condensada, Facultad de Ciencias, Universidad de Zaragoza, Calle Pedro Cerbuna 12, 50009 Zaragoza, Spain; [email protected]; Laboratorio de Microscopías Avanzadas (LMA), Instituto de Nanociencia de Aragón (INA), Edificio de I+D, Campus Río Ebro, 50018 Zaragoza, Spain 
 Instituto de Ciencia de Materiales de Aragón (ICMA, CSIC-Universidad de Zaragoza) and Departamento de Física de la Materia Condensada, Facultad de Ciencias, Universidad de Zaragoza, Calle Pedro Cerbuna 12, 50009 Zaragoza, Spain; [email protected] 
 Instituto de Ciencia Molecular, Universitat de València, Catedrático José Beltrán 2, 46980, Paterna, Spain; [email protected] 
 Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg; [email protected] 
First page
799
Publication year
2019
Publication date
2019
Publisher
MDPI AG
e-ISSN
2072666X
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2548930232
Copyright
© 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.