Abstract

Thin films of poly (methyl methacrylate) (PMMA) were prepared on n-Si substrate and indium tin oxide (ITO) glass was prepared by spin coating. High frequency capacitance- voltage (C-V) and current-voltage (I-V) characterization were carried out on the Al/PMMA/n- Si and Al/PMMA/ITO glass structures, with the films as the insulator layer to evaluate the electrical properties. For the PMMA, the dielectric constant value obtained was about 3.9 at 1 MHz. The breakdown field strength of PMMA can be influenced by the impurities and surface charges or the interface states in the Si substrate. The average transmittance value of the PMMA/ITO glass layer was above 80% in the visible range.

Details

Title
The optical and electrical characteristics of PMMA film prepared by spin coating method
Author
Zhang, H Q 1 ; Jin, Y 1 ; Qiu, Y 2 

 School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, China; Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116024, China 
 School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, China 
Publication year
2015
Publication date
Jul 2015
Publisher
IOP Publishing
ISSN
17578981
e-ISSN
1757899X
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2563899122
Copyright
© 2015. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.