Abstract

Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

Details

Title
High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography
Author
Kabouraki, Elmina 1 ; Melissinaki, Vasileia 1 ; Yadav, Amit 2 ; Melninkaitis, Andrius 3 ; Tourlouki, Konstantina 4 ; Tachtsidis, Theodoros 4 ; Kehagias, Nikolaos 5   VIAFID ORCID Logo  ; Barmparis, Georgios D 6 ; Papazoglou, Dimitris G 7 ; Rafailov, Edik 2 ; Farsari, Maria 1 

1  FORTH/IESL, N. Plastira 100, Heraklion 70013, Greece 
2  Optoelectronics and Biomedical Photonics Group, AIPT, Aston University, Birmingham B4 7ET, UK 
3  Laser Research Center, Vilnius University, Saulėtelio al. 10, Vilnius 10223, Lithuania; Lidaris Ltd., Saulėtekio al. 10, Vilnius LT-10223, Lithuania 
4  Nanotypos, VEPE Technopoli Thessaloniki, Building C2, Pylea, Thessaloniki 55535, Greece 
5  Nanotypos, VEPE Technopoli Thessaloniki, Building C2, Pylea, Thessaloniki 55535, Greece; NCSR Demokritos, Institute of Nanoscience and Nanotechnology, P. Grigoriou 27 & Neapoleos Str., Ag. Paraskevi 15341, Greece 
6  Physics Department, University of Crete, Heraklion 70013, Greece 
7  FORTH/IESL, N. Plastira 100, Heraklion 70013, Greece; Materials Science and Technology Department, University of Crete, Heraklion 70013, Greece 
Pages
3759-3768
Publication year
2021
Publication date
2021
Publisher
Walter de Gruyter GmbH
ISSN
21928606
e-ISSN
21928614
Source type
Scholarly Journal
Language of publication
English
DOI
https://doi.org/10.1515/nanoph-2021-0263
ProQuest document ID
2587215761
Copyright
© 2021. This work is published under http://creativecommons.org/licenses/by/4.0 (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.