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Abstract
Atomically thin transition metal dichalcogenides (TMDCs) present a promising platform for numerous photonic applications due to excitonic spectral features, possibility to tune their constants by external gating, doping, or light, and mechanical stability. Utilization of such materials for sensing or optical modulation purposes would require a clever optical design, as by itself the 2D materials can offer only a small optical phase delay – consequence of the atomic thickness. To address this issue, we combine films of 2D semiconductors which exhibit excitonic lines with the Fabry-Perot resonators of the standard commercial SiO2/Si substrate, in order to realize topological phase singularities in reflection. Around these singularities, reflection spectra demonstrate rapid phase changes while the structure behaves as a perfect absorber. Furthermore, we demonstrate that such topological phase singularities are ubiquitous for the entire class of atomically thin TMDCs and other high-refractive-index materials, making it a powerful tool for phase engineering in flat optics. As a practical demonstration, we employ PdSe2 topological phase singularities for a refractive index sensor and demonstrate its superior phase sensitivity compared to typical surface plasmon resonance sensors.
The authors combine films of two-dimensional semiconductors, which exhibit excitonic spectral features, with SiO2/Si Fabry-Perot resonators in order to realize topological phase singularities in reflection. Around these singularities, the reflection spectra demonstrate rapid phase changes while the structure behaves as a perfect absorber.
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1 Moscow Institute of Physics and Technology, Center for Photonics and 2D Materials, Dolgoprudny, Russia (GRID:grid.18763.3b) (ISNI:0000000092721542)
2 University of Manchester, Department of Physics and Astronomy, Manchester, UK (GRID:grid.5379.8) (ISNI:0000000121662407)
3 University of Manchester, National Graphene Institute (NGI), Manchester, UK (GRID:grid.5379.8) (ISNI:0000000121662407)
4 Moscow Institute of Physics and Technology, Center for Photonics and 2D Materials, Dolgoprudny, Russia (GRID:grid.18763.3b) (ISNI:0000000092721542); Dukhov Research Institute of Automatics (VNIIA), Moscow, Russia (GRID:grid.472660.1)
5 National Research Nuclear University MEPhI (Moscow Engineering Physics Institute), Moscow, Russia (GRID:grid.183446.c) (ISNI:0000 0000 8868 5198)
6 Moscow Institute of Physics and Technology, Center for Photonics and 2D Materials, Dolgoprudny, Russia (GRID:grid.18763.3b) (ISNI:0000000092721542); GrapheneTek, Moscow, Russia (GRID:grid.18763.3b)
7 University of Manchester, National Graphene Institute (NGI), Manchester, UK (GRID:grid.5379.8) (ISNI:0000000121662407); National University of Singapore, Department of Materials Science and Engineering, Singapore, Singapore (GRID:grid.4280.e) (ISNI:0000 0001 2180 6431); Chongqing 2D Materials Institute, Chongqing, China (GRID:grid.510936.8)
8 Moscow Institute of Physics and Technology, Center for Photonics and 2D Materials, Dolgoprudny, Russia (GRID:grid.18763.3b) (ISNI:0000000092721542); XPANCEO, Moscow, Russia (GRID:grid.18763.3b)