Abstract

We have synthesized thin films of nickel oxide (NiO) on silver and glass substrates, at very low temperature of 60°C, by chemical bath deposition (CBD) method. The precursor used consists of nickel nitrate and aqueous ammonia. Structural characteristics were studied using x-ray diffraction (XRD) and morphological studies were done using scanning electron microscopy (SEM). Ultraviolet-visible (UV-Vis) spectroscopy was used for optical studies. To investigate electrochemical behaviour of thin film electrode materials, cyclic voltammetry (CV) measurements were conducted. For electrochemical studies the galvanostatic charge/discharge (GCD) tests were also conducted. The formation of face centred cubic NiO structure was confirmed using XRD. The scanning electron microscopy images show uniform distribution of worm-like porous morphology. CV measurements revealed the capacitive behaviour of the films.

Details

Title
Chemical bath deposited Nickel oxide thin film as electrode material for pseudocapacitors
Author
Sathyan, T V 1 ; Nygil, Thomas 2 ; Thomas, Jasmine 2 ; Deepa, K 3 ; Remadevi, T L 4 

 School of Pure and Applied Physics, Dept. of Physics, Kannur University , Kerala , India; Dept. of Physics, Nehru Arts and Science College , Kanhangad, Kerala . India 
 Dept. of Chemistry, Nirmalagiri College , Kuthuparamba, Kerala , India 
 Dept. of Physics, PRNSS College , Mattannur, Kerala , India 
 School of Pure and Applied Physics, Dept. of Physics, Kannur University , Kerala , India 
First page
012019
Publication year
2022
Publication date
Oct 2022
Publisher
IOP Publishing
ISSN
17578981
e-ISSN
1757899X
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2729095532
Copyright
Published under licence by IOP Publishing Ltd. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.