Abstract

High thermal conductivity electronic materials are critical components for high-performance electronic and photonic devices as both active functional materials and thermal management materials. We report an isotropic high thermal conductivity exceeding 500 W m−1K−1 at room temperature in high-quality wafer-scale cubic silicon carbide (3C-SiC) crystals, which is the second highest among large crystals (only surpassed by diamond). Furthermore, the corresponding 3C-SiC thin films are found to have record-high in-plane and cross-plane thermal conductivity, even higher than diamond thin films with equivalent thicknesses. Our results resolve a long-standing puzzle that the literature values of thermal conductivity for 3C-SiC are lower than the structurally more complex 6H-SiC. We show that the observed high thermal conductivity in this work arises from the high purity and high crystal quality of 3C-SiC crystals which avoids the exceptionally strong defect-phonon scatterings. Moreover, 3C-SiC is a SiC polytype which can be epitaxially grown on Si. We show that the measured 3C-SiC-Si thermal boundary conductance is among the highest for semiconductor interfaces. These findings provide insights for fundamental phonon transport mechanisms, and suggest that 3C-SiC is an excellent wide-bandgap semiconductor for applications of next-generation power electronics as both active components and substrates.

High thermal conductivity electronic materials are critical for next-generation electronics and photonics. Here, the authors report isotropic high thermal conductivity of 3C-SiC wafers exceeding 500 W m−1K−1.

Details

Title
High thermal conductivity in wafer-scale cubic silicon carbide crystals
Author
Cheng, Zhe 1   VIAFID ORCID Logo  ; Liang, Jianbo 2   VIAFID ORCID Logo  ; Kawamura, Keisuke 3 ; Zhou, Hao 4 ; Asamura, Hidetoshi 5 ; Uratani, Hiroki 3 ; Tiwari, Janak 4 ; Graham, Samuel 6 ; Ohno, Yutaka 7   VIAFID ORCID Logo  ; Nagai, Yasuyoshi 7 ; Feng, Tianli 4 ; Shigekawa, Naoteru 8 ; Cahill, David G. 1   VIAFID ORCID Logo 

 University of Illinois at Urbana-Champaign, Department of Materials Science and Engineering and Materials Research Laboratory, Urbana, USA (GRID:grid.35403.31) (ISNI:0000 0004 1936 9991) 
 Osaka Metropolitan University, Department of Physics and Electronics, Osaka, Japan (GRID:grid.35403.31) 
 SIC Division, Air Water Inc., Nagano, Japan (GRID:grid.509474.b) 
 University of Utah, Department of Mechanical Engineering, Salt Lake City, USA (GRID:grid.223827.e) (ISNI:0000 0001 2193 0096) 
 Specialty Materials Dept., Electronics Unit, Azusagawa, Japan (GRID:grid.223827.e) 
 Georgia Institute of Technology, George W. Woodruff School of Mechanical Engineering, Atlanta, USA (GRID:grid.213917.f) (ISNI:0000 0001 2097 4943) 
 Tohoku University, Institute for Materials Research, Oarai, Japan (GRID:grid.69566.3a) (ISNI:0000 0001 2248 6943) 
 Osaka Metropolitan University, Department of Physics and Electronics, Osaka, Japan (GRID:grid.223827.e) 
Publication year
2022
Publication date
2022
Publisher
Nature Publishing Group
e-ISSN
20411723
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2739340934
Copyright
© The Author(s) 2022. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.