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Abstract
High thermal conductivity electronic materials are critical components for high-performance electronic and photonic devices as both active functional materials and thermal management materials. We report an isotropic high thermal conductivity exceeding 500 W m−1K−1 at room temperature in high-quality wafer-scale cubic silicon carbide (3C-SiC) crystals, which is the second highest among large crystals (only surpassed by diamond). Furthermore, the corresponding 3C-SiC thin films are found to have record-high in-plane and cross-plane thermal conductivity, even higher than diamond thin films with equivalent thicknesses. Our results resolve a long-standing puzzle that the literature values of thermal conductivity for 3C-SiC are lower than the structurally more complex 6H-SiC. We show that the observed high thermal conductivity in this work arises from the high purity and high crystal quality of 3C-SiC crystals which avoids the exceptionally strong defect-phonon scatterings. Moreover, 3C-SiC is a SiC polytype which can be epitaxially grown on Si. We show that the measured 3C-SiC-Si thermal boundary conductance is among the highest for semiconductor interfaces. These findings provide insights for fundamental phonon transport mechanisms, and suggest that 3C-SiC is an excellent wide-bandgap semiconductor for applications of next-generation power electronics as both active components and substrates.
High thermal conductivity electronic materials are critical for next-generation electronics and photonics. Here, the authors report isotropic high thermal conductivity of 3C-SiC wafers exceeding 500 W m−1K−1.
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1 University of Illinois at Urbana-Champaign, Department of Materials Science and Engineering and Materials Research Laboratory, Urbana, USA (GRID:grid.35403.31) (ISNI:0000 0004 1936 9991)
2 Osaka Metropolitan University, Department of Physics and Electronics, Osaka, Japan (GRID:grid.35403.31)
3 SIC Division, Air Water Inc., Nagano, Japan (GRID:grid.509474.b)
4 University of Utah, Department of Mechanical Engineering, Salt Lake City, USA (GRID:grid.223827.e) (ISNI:0000 0001 2193 0096)
5 Specialty Materials Dept., Electronics Unit, Azusagawa, Japan (GRID:grid.223827.e)
6 Georgia Institute of Technology, George W. Woodruff School of Mechanical Engineering, Atlanta, USA (GRID:grid.213917.f) (ISNI:0000 0001 2097 4943)
7 Tohoku University, Institute for Materials Research, Oarai, Japan (GRID:grid.69566.3a) (ISNI:0000 0001 2248 6943)
8 Osaka Metropolitan University, Department of Physics and Electronics, Osaka, Japan (GRID:grid.223827.e)