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Abstract
Defects in solids are unavoidable and can create complex electronic states that can significantly influence the electrical and optical properties of semiconductors. With the rapid progress in the integration of 2D semiconductors in practical devices, it is imperative to understand and characterize the influence of defects in this class of materials. Here, we examine the electrical response of defect filling and emission using deep level transient spectroscopy (DLTS) and reveal defect states and their hybridization in a monolayer MOCVD-grown material deposited on CMOS-compatible substrates. Supported by aberration-corrected STEM imaging and theoretical calculations, we find that neighboring sulfur vacancy pairs introduce additional shallow trap states via hybridization of individual vacancy levels. Even though such vacancy pairs only represent ~10% of the total defect concentration, they can have a substantial influence on the off currents and switching slopes of field-effect transistors based on 2D semiconductors. Our technique, which can quantify the energy states of different defects and their interactions, allows rapid and nondestructive electrical characterization of defect states important for the defect engineering of 2D semiconductors.
Deep level transient spectroscopy (DLTS) is an established characterization technique used to study electrically active defects in 3D semiconductors. Here, the authors show that DLTS can also be applied to monolayer semiconductors, enabling in-situ characterization of the energy states of different defects and their interactions.
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1 École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering, Lausanne, Switzerland (GRID:grid.5333.6) (ISNI:0000000121839049); École Polytechnique Fédérale de Lausanne (EPFL), Institute of Materials Science and Engineering, Lausanne, Switzerland (GRID:grid.5333.6) (ISNI:0000000121839049)
2 École Polytechnique Fédérale de Lausanne (EPFL), Institute of Physics, Lausanne, Switzerland (GRID:grid.5333.6) (ISNI:0000000121839049)
3 École Polytechnique Fédérale de Lausanne (EPFL), Institute of Electrical and Microengineering, Lausanne, Switzerland (GRID:grid.5333.6) (ISNI:0000000121839049); École Polytechnique Fédérale de Lausanne (EPFL), Institute of Materials Science and Engineering, Lausanne, Switzerland (GRID:grid.5333.6) (ISNI:0000000121839049); National University of Singapore, Department of Materials Science and Engineering, Singapore, Singapore (GRID:grid.4280.e) (ISNI:0000 0001 2180 6431)