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Abstract
Resistive switching random access memory (ReRAM) where the resistance of the active semiconducting layer can be changed as a function of applied voltage has been becoming popular due to its simple structure and design. In the present study, we have used MoS2–SnO2 nanocomposite as a resistive switching material, where the effect of MoS2 weight percentage (0, 5, 7, and 10 wt.%) have been evaluated in terms of the structural, optical, and electrical properties changes of resulting nanocomposite using X-ray diffraction, UV–Visible Spectroscopy, Scanning electron microscopy, and Transmission electron microscopy techniques. The nanocomposite samples were synthesized using a simple hydrothermal technique and are spin-coated on commercially available ITO-PET substrate. The top metallic electrode was deposited by thermally evaporating Aluminium through a shadow mask resulting in Al/SnO2/ITO-PET and Al/MoS2–SnO2/ITO-PET (5%, 7%, 10%) based resistive memory devices. The measured current–voltage (I–V) characteristics over the fabricated devices having different MoS2 wt. % showed the increase in IOn/IOff ratio (3, 6, and 25) with an increase in MoS2 concentration.






