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Abstract
Reservoir computing (RC) offers efficient temporal information processing with low training cost. All-ferroelectric implementation of RC is appealing because it can fully exploit the merits of ferroelectric memristors (e.g., good controllability); however, this has been undemonstrated due to the challenge of developing ferroelectric memristors with distinctly different switching characteristics specific to the reservoir and readout network. Here, we experimentally demonstrate an all-ferroelectric RC system whose reservoir and readout network are implemented with volatile and nonvolatile ferroelectric diodes (FDs), respectively. The volatile and nonvolatile FDs are derived from the same Pt/BiFeO3/SrRuO3 structure via the manipulation of an imprint field (Eimp). It is shown that the volatile FD with Eimp exhibits short-term memory and nonlinearity while the nonvolatile FD with negligible Eimp displays long-term potentiation/depression, fulfilling the functional requirements of the reservoir and readout network, respectively. Hence, the all-ferroelectric RC system is competent for handling various temporal tasks. In particular, it achieves an ultralow normalized root mean square error of 0.017 in the Hénon map time-series prediction. Besides, both the volatile and nonvolatile FDs demonstrate long-term stability in ambient air, high endurance, and low power consumption, promising the all-ferroelectric RC system as a reliable and low-power neuromorphic hardware for temporal information processing.
While reservoir computing can process temporal information efficiently, its hardware implementation remains a challenge due to the lack of robust and energy efficient hardware. Here, the authors develop an all-ferroelectric reservoir computing system, showing high accuracies and low power consumptions in various tasks like the time-series prediction.
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1 South China Normal University, Institute for Advanced Materials and Guangdong Provincial Key Laboratory of Optical Information Materials and Technology, South China Academy of Advanced Optoelectronics, Guangzhou, China (GRID:grid.263785.d) (ISNI:0000 0004 0368 7397)
2 South China Normal University, National Center for International Research on Green Optoelectronics, Guangzhou, China (GRID:grid.263785.d) (ISNI:0000 0004 0368 7397)
3 South China Normal University, Institute for Advanced Materials and Guangdong Provincial Key Laboratory of Optical Information Materials and Technology, South China Academy of Advanced Optoelectronics, Guangzhou, China (GRID:grid.263785.d) (ISNI:0000 0004 0368 7397); Nanjing University, Laboratory of Solid State Microstructures and Innovation Center of Advanced Microstructures, Nanjing, China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X)