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Abstract
Surface amorphization provides electrocatalysts with more active sites and flexibility. However, there is still a lack of experimental observations and mechanistic explanations for the in situ amorphization process and its crucial role. Herein, we propose the concept that by in situ reconstructed amorphous surface, metal phosphorus trichalcogenides could intrinsically offer better catalytic performance for the alkaline hydrogen production. Trace Ru (0.81 wt.%) is doped into NiPS3 nanosheets for alkaline hydrogen production. Using in situ electrochemical transmission electron microscopy technique, we confirmed the amorphization process occurred on the edges of NiPS3 is critical for achieving superior activity. Comprehensive characterizations and theoretical calculations reveal Ru primarily stabilized at edges of NiPS3 through in situ formed amorphous layer containing bridging S22− species, which can effectively reduce the reaction energy barrier. This work emphasizes the critical role of in situ formed active layer and suggests its potential for optimizing catalytic activities of electrocatalysts.
Surface amorphization generally provides electrocatalysts with more active sites and flexibility. Here it is employed in-situ liquid TEM to observe the surface reconstruction on Ru-NiPS3 nanosheets, confirming that the amorphization on the edges of NiPS3 is critical for achieving superior activity.
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1 The Hong Kong Polytechnic University, Department of Applied Physics, Kowloon, China (GRID:grid.16890.36) (ISNI:0000 0004 1764 6123)
2 City University of Hong Kong, Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), Kowloon, China (GRID:grid.35030.35) (ISNI:0000 0004 1792 6846); City University of Hong Kong, Department of Chemistry and State Key Laboratory of Marine Pollution, Hong Kong, China (GRID:grid.35030.35) (ISNI:0000 0004 1792 6846); City University of Hong Kong Shenzhen Research Institute, Shenzhen, China (GRID:grid.464255.4)
3 Huaiyin Normal University, Phyics Department and Jiangsu Key Laboratory for Chemistry of Low-Demensional Materials, Huaian, China (GRID:grid.410738.9) (ISNI:0000 0004 1804 2567)
4 The Hong Kong Polytechnic University, Department of Applied Physics, Kowloon, China (GRID:grid.16890.36) (ISNI:0000 0004 1764 6123); The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen, China (GRID:grid.16890.36) (ISNI:0000 0004 1764 6123)