It appears you don't have support to open PDFs in this web browser. To view this file, Open with your PDF reader
Abstract
The practical applications of solar-driven water splitting pivot on significant advances that enable scalable production of robust photoactive films. Here, we propose a proof-of-concept for fabricating robust photoactive films by a particle-implanting technique (PiP) which embeds semiconductor photoabsorbers in the liquid metal. The strong semiconductor/metal interaction enables resulting films efficient collection of photogenerated charges and superior photoactivity. A photoanode of liquid-metal embraced BiVO4 can stably operate over 120 h and retain ~ 70% of activity when scaled from 1 to 64 cm2. Furthermore, a Z-scheme photocatalyst film of liquid-metal embraced BiVO4 and Rh-doped SrTiO3 particles can drive overall water splitting under visible light, delivering an activity 2.9 times higher than that of the control film with gold support and a 110 h stability. These results demonstrate the advantages of the PiP technique in constructing robust and efficient photoactive films for artificial photosynthesis.
The practical applications of photoelectrochemical water splitting pivot on significant advances that enable scalable production of robust photoactive films. Here, the authors propose a proof-of-concept for fabricating bioinspired robust photoactive films by a particle implanting technique, which embeds semiconductor photoabsorbers in the liquid metal.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer
Details






1 Chinese Academy of Sciences, Shenyang National Laboratory for Materials Science, Institute of Metal Research, Shenyang, China (GRID:grid.9227.e) (ISNI:0000 0001 1957 3309)
2 Northeastern University, Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), Shenyang, China (GRID:grid.412252.2) (ISNI:0000 0004 0368 6968)
3 Chinese Academy of Sciences, State Key Laboratory of Catalysis, Dalian National Laboratory for Clean Energy, iChEM, Dalian Institute of Chemical Physics, Dalian, China (GRID:grid.9227.e) (ISNI:0000000119573309)
4 Tongji University, School of Chemical Science and Engineering, Shanghai, China (GRID:grid.24516.34) (ISNI:0000 0001 2370 4535)
5 The University of Queensland, Nanomaterials Centre, School of Chemical Engineering and AIBN, Brisbane, Australia (GRID:grid.1003.2) (ISNI:0000 0000 9320 7537)
6 University of Surrey, Guilford, UK (GRID:grid.5475.3) (ISNI:0000 0004 0407 4824)
7 Shinshu University, Research Initiative for Supra-Materials, Nagano, Japan (GRID:grid.263518.b) (ISNI:0000 0001 1507 4692); The University of Tokyo, Office of University Professors, Tokyo, Japan (GRID:grid.26999.3d) (ISNI:0000 0001 2151 536X)
8 Chinese Academy of Sciences, Shenyang National Laboratory for Materials Science, Institute of Metal Research, Shenyang, China (GRID:grid.9227.e) (ISNI:0000 0001 1957 3309); Chinese Academy of Sciences, Shenzhen Institute of Advanced Technology, Shenzhen, China (GRID:grid.9227.e) (ISNI:0000000119573309)
9 Chinese Academy of Sciences, Shenyang National Laboratory for Materials Science, Institute of Metal Research, Shenyang, China (GRID:grid.9227.e) (ISNI:0000 0001 1957 3309); University of Science and Technology of China, School of Materials Science and Engineering, Shenyang, China (GRID:grid.59053.3a) (ISNI:0000 0001 2167 9639)