Content area

Abstract

This work experimentally investigated the wake-up behaviors of hafnium oxide-based ferroelectric capacitors by manipulating the interval time between each characterization cycle. Both Positive-Up–Negative-Down (PUND) and Negative-Down–Positive-Up (NDPU) waveforms were used as the stress and measurement waveforms in the experiments. It was found that the imprint occurs as the total interval time increases to a several-seconds level. However, this only affects the remnant polarization (PR) of ferroelectric capacitors when stressed by NDPU waveforms, since the voltage amplitude saturates under the PUND stress conditions and does not influence the PR. The wake-up behavior has been proved to be caused by the defects redistribution during electrical cycling. Notably, when using PUND waveforms, the change in the interval time can result in different increase rates of PR, indicating the possibility of recovery during the intervals. This recovery leads to a slower wake-up when cycling with a longer interval time. Moreover, it is observed that this PR recovery could reach saturation after several seconds of the interval time. This comprehensive investigation of wake-up and imprint behaviors can provide new insights to evaluate and enhance the reliability of ferroelectric memories.

Details

1009240
Business indexing term
Title
Wake-Up and Imprint Effects in Hafnium Oxide-Based Ferroelectric Capacitors during Cycling with Different Interval Times
Author
Ding, Yaru 1 ; Weng, Zeping 1 ; Zhangsheng Lan 1   VIAFID ORCID Logo  ; Chu, Yan 1 ; Cai, Daolin 2 ; Qu, Yiming 2   VIAFID ORCID Logo  ; Zhao, Yi 3 

 College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China; [email protected] (Y.D.); [email protected] (Z.W.); [email protected] (Z.L.); [email protected] (C.Y.); International Joint Innovation Center, Zhejiang University, Haining 314400, China 
 School of Integrated Circuits, East China Normal University, Shanghai 200241, China; [email protected] 
 College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China; [email protected] (Y.D.); [email protected] (Z.W.); [email protected] (Z.L.); [email protected] (C.Y.); International Joint Innovation Center, Zhejiang University, Haining 314400, China; State Key Laboratory of Silicon and Advanced Semiconductor Materials, Zhejiang University, Hangzhou 310027, China 
Publication title
Volume
13
Issue
6
First page
1021
Publication year
2024
Publication date
2024
Publisher
MDPI AG
Place of publication
Basel
Country of publication
Switzerland
Publication subject
e-ISSN
20799292
Source type
Scholarly Journal
Language of publication
English
Document type
Journal Article
Publication history
 
 
Online publication date
2024-03-08
Milestone dates
2024-01-25 (Received); 2024-03-06 (Accepted)
Publication history
 
 
   First posting date
08 Mar 2024
ProQuest document ID
2999181116
Document URL
https://www.proquest.com/scholarly-journals/wake-up-imprint-effects-hafnium-oxide-based/docview/2999181116/se-2?accountid=208611
Copyright
© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.
Last updated
2024-08-26
Database
ProQuest One Academic