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© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

Recently, considerable work has been directed at the development of an ultracompact X-ray free-electron laser (UCXFEL) based on emerging techniques in high-field cryogenic acceleration, with attendant dramatic improvements in electron beam brightness and state-of-the-art concepts in beam dynamics, magnetic undulators, and X-ray optics. A full conceptual design of a 1 nm (1.24 keV) UCXFEL with a length and cost over an order of magnitude below current X-ray free-electron lasers (XFELs) has resulted from this effort. This instrument has been developed with an emphasis on permitting exploratory scientific research in a wide variety of fields in a university setting. Concurrently, compact FELs are being vigorously developed for use as instruments to enable next-generation chip manufacturing through use as a high-flux, few nm lithography source. This new role suggests consideration of XFELs to urgently address emerging demands in the semiconductor device sector, as identified by recent national need studies, for new radiation sources aimed at chip manufacturing. Indeed, it has been shown that one may use coherent X-rays to perform 10–20 nm class resolution surveys of macroscopic, cm scale structures such as chips, using ptychographic laminography techniques. As the XFEL is a very promising candidate for realizing such methods, we present here an analysis of the issues and likely solutions associated with extending the UCXFEL to harder X-rays (above 7 keV), much higher fluxes, and increased levels of coherence, as well as methods of applying such a source for ptychographic laminography to microelectronic device measurements. We discuss the development path to move the concept to rapid realization of a transformative XFEL-based application, outlining both FEL and metrology system challenges.

Details

Title
A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs
Author
Rosenzweig, James B 1 ; Andonian, Gerard 1   VIAFID ORCID Logo  ; Agustsson, Ronald 2 ; Anisimov, Petr M 3   VIAFID ORCID Logo  ; Araujo, Aurora 2 ; Bosco, Fabio 1 ; Carillo, Martina 4 ; Chiadroni, Enrica 4 ; Giannessi, Luca 5 ; Huang, Zhirong 6 ; Fukasawa, Atsushi 1   VIAFID ORCID Logo  ; Kim, Dongsung 3 ; Kutsaev, Sergey 2   VIAFID ORCID Logo  ; Lawler, Gerard 1   VIAFID ORCID Logo  ; Li, Zenghai 6 ; Majernik, Nathan 6 ; Manwani, Pratik 1   VIAFID ORCID Logo  ; Maxson, Jared 7 ; Miao, Janwei 1 ; Migliorati, Mauro 4   VIAFID ORCID Logo  ; Mostacci, Andrea 4 ; Musumeci, Pietro 1 ; Murokh, Alex 2 ; Nanni, Emilio 6   VIAFID ORCID Logo  ; Sean O’Tool 1 ; Palumbo, Luigi 4 ; Robles, River 6   VIAFID ORCID Logo  ; Sakai, Yusuke 1   VIAFID ORCID Logo  ; Simakov, Evgenya I 3 ; Singleton, Madison 6   VIAFID ORCID Logo  ; Spataro, Bruno 5   VIAFID ORCID Logo  ; Tang, Jingyi 6 ; Tantawi, Sami 6 ; Williams, Oliver 1   VIAFID ORCID Logo  ; Xu, Haoran 3   VIAFID ORCID Logo  ; Yadav, Monika 1   VIAFID ORCID Logo 

 Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA; [email protected] (G.A.); [email protected] (A.F.); [email protected] (J.M.); [email protected] (S.O.); [email protected] (O.W.); 
 RadiaBeam Technologies, 1717 Stewart Ave., Santa Monica, CA 90404, USA[email protected] (A.M.) 
 Los Alamos National Laboratory, Los Alamos, NM 87545, USA[email protected] (E.I.S.); [email protected] (H.X.) 
 Dipartimento di Scienze di Base e Applicate per l’Ingegneria, University of Rome “La Sapienza”, 00161 Rome, Italy[email protected] (E.C.); [email protected] (M.M.); [email protected] (L.P.) 
 INFN Laboratori Nazionali di Frascati, Via Enrico Fermi, 54, 00044 Rome, Italy[email protected] (B.S.) 
 SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA; [email protected] (Z.H.); [email protected] (N.M.); [email protected] (E.N.); [email protected] (R.R.); 
 Department of Physics, Cornell University, 109 Clark Hall, Ithaca, NY 14853, USA 
First page
19
Publication year
2024
Publication date
2024
Publisher
MDPI AG
e-ISSN
2410390X
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
3002346367
Copyright
© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.