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© 2023 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

This study describes a method by which to synthesize SiO2-based graphene nanoballs (SGB) using atmospheric pressure chemical vapor deposition (APCVD) with copper vapor assistance. This method should solve the contamination, damage, and high costs associated with silica-based indirect graphene synthesis. The SGB was synthesized using APCVD, which was optimized using the Taguchi method. Multiple synthesis factors were optimized and investigated to find the ideal synthesis condition to grow SGB for thermoelectric (TE) applications. Raman spectra and FESEM-EDX reveal that the graphene formed on the silicon nanoparticles (SNP) is free from copper. The prepared SGB has excellent electrical conductivity (75.0 S/cm), which shows better results than the previous report. Furthermore, the SGB nanofillers in bismuth telluride (Bi2Te3) nanocomposites as TE materials exhibit a significant increment in Seebeck coefficients (S) compared to the pure Bi2Te3 sample from 109 to 170 μV/K at 400 K, as well as electrical resistivity decrement. This approach would offer a simple strategy to improve the TE performance of commercially available TE materials, which is critical for large-scale industrial applications.

Details

Title
Synthesis and Characterization of SiO2-Based Graphene Nanoballs Using Copper-Vapor-Assisted APCVD for Thermoelectric Application
Author
Zulkepli, Nurkhaizan 1   VIAFID ORCID Logo  ; Jumril Yunas 2   VIAFID ORCID Logo  ; Muhammad Aniq Shazni Mohammad Haniff 2 ; Dedi 3   VIAFID ORCID Logo  ; Mohamad Shukri Sirat 2   VIAFID ORCID Logo  ; Muhammad Hilmi Johari 2 ; Nur Nasyifa Mohd Maidin 2   VIAFID ORCID Logo  ; Aini Ayunni Mohd Raub 2   VIAFID ORCID Logo  ; Hamzah, Azrul Azlan 2   VIAFID ORCID Logo 

 Institute of Microengineering and Nanoelectronic (IMEN), Universiti Kebangsaan Malaysia (UKM), Bangi 46300, Selangor, Malaysia; [email protected] (N.Z.); [email protected] (M.A.S.M.H.); [email protected] (M.S.S.); [email protected] (M.H.J.); [email protected] (N.N.M.M.); [email protected] (A.A.M.R.); Centre of Foundation Studies, Universiti Teknologi MARA, Cawangan Selangor, Kampus Dengkil, Dengkil 43800, Selangor, Malaysia 
 Institute of Microengineering and Nanoelectronic (IMEN), Universiti Kebangsaan Malaysia (UKM), Bangi 46300, Selangor, Malaysia; [email protected] (N.Z.); [email protected] (M.A.S.M.H.); [email protected] (M.S.S.); [email protected] (M.H.J.); [email protected] (N.N.M.M.); [email protected] (A.A.M.R.) 
 Research Center for Advanced Materials, National Research and Innovation Agency (BRIN), South Tangerang 15314, Banten, Indonesia; [email protected] 
First page
618
Publication year
2024
Publication date
2024
Publisher
MDPI AG
e-ISSN
20794991
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
3037450116
Copyright
© 2023 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.