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Abstract
Two-dimensional (2D) ferroelectric materials have emerged as significant platforms for multi-functional three-dimensional (3D) integrated electronic devices. Among 2D ferroelectric materials, ferro-ionic CuInP2S6 has the potential to achieve the versatile advances in neuromorphic computing systems due to its phase tunability and ferro-ionic characteristics. As CuInP2S6 exhibits a ferroelectric phase with insulating properties at room temperature, the external temperature and electrical field should be required to activate the ferro-ionic conduction. Nevertheless, such external conditions inevitably facilitate stochastic ionic conduction, which completely limits the practical applications of 2D ferro-ionic materials. Herein, free-standing 2D ferroelectric heterostructure is mechanically manipulated for nano-confined conductive filaments growth in free-standing 2D ferro-ionic memristor. The ultra-high mechanical bending is selectively facilitated at the free-standing area to spatially activate the ferro-ionic conduction, which allows the deterministic local positioning of Cu+ ion transport. According to the local flexoelectric engineering, 5.76×102-fold increased maximum current is observed within vertical shear strain 720 nN, which is theoretically supported by the 3D flexoelectric simulation. In conclusion, we envision that our universal free-standing platform can provide the extendable geometric solution for ultra-efficient self-powered system and reliable neuromorphic device.
2D ferroelectric materials have emerged as significant platforms for next-generation functional devices. Here, the authors present the programmable flexoelectric engineering for nanoconfined conductive filaments in free-standing 2D ferro-ionic memristor.
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1 Sungkyunkwan University (SKKU), School of Mechanical Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Institute for Basic Science (IBS), Center for Quantum Nanoscience, Seoul, Republic of Korea (GRID:grid.410720.0) (ISNI:0000 0004 1784 4496)
2 Sungkyunkwan University, SKKU Advanced Institute of Nanotechnology (SAINT), Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, Department of Nano Science and Technology, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X)
3 Sungkyunkwan University (SKKU), School of Mechanical Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X)
4 Sungkyunkwan University, Department of Semiconductor Convergence Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X)
5 Samsung Electronics, AVP Process Development Team, Cheonan-si, Republic of Korea (GRID:grid.419666.a) (ISNI:0000 0001 1945 5898)
6 Sungkyunkwan University, SKKU Advanced Institute of Nanotechnology (SAINT), Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, Department of Nano Science and Technology, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, Department of Nano Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X)
7 Institute for Basic Science (IBS), Center for Quantum Nanoscience, Seoul, Republic of Korea (GRID:grid.410720.0) (ISNI:0000 0004 1784 4496); Ewha Womans University, Department of Physics, Seoul, Republic of Korea (GRID:grid.255649.9) (ISNI:0000 0001 2171 7754)
8 Sungkyunkwan University (SKKU), School of Mechanical Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, SKKU Advanced Institute of Nanotechnology (SAINT), Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, Department of Nano Science and Technology, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, Department of Semiconductor Convergence Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X); Sungkyunkwan University, Department of Nano Engineering, Suwon-si, Republic of Korea (GRID:grid.264381.a) (ISNI:0000 0001 2181 989X)