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© 2025 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

Measuring weak magnetic fields proposes significant challenges to the sensing capabilities of magnetic field sensors. The magnetic field detection capacity of tunnel magnetoresistance (TMR) sensors is often insufficient for such applications, necessitating targeted optimization strategies to improve their performance in weak-field measurements. Utilizing magnetic flux concentrators (MFCs) offers an effective approach to enhance TMR sensitivity. In this study, the finite element method was employed to analyze the effects of different MFC geometric structures on the uniformity of the magnetic field in the air gap and the magnetic circuit gain (MCG). It was determined that the MCG of the MFC is not directly related to the absolute values of its parameters but rather to their ratios. Simulation analyses evaluated the impact of these parameter ratios on both the MCG and its spatial distribution uniformity, leading to the formulation of MFC design optimization principles. Building on these simulation-derived principles, several MFCs were fabricated using the 1J85 material, and an experimental platform was established to validate the simulation findings. The fabricated MFCs achieved an MCG of 7.325 times. Based on the previously developed TMR devices, a detection sensitivity of 2.46 nT/Hz @1Hz was obtained. By optimizing parameter configurations, this work provides theoretical guidance for further enhancing the performance of TMR sensors in magnetic field measurements.

Details

Title
The Influence of Dimensional Parameters on the Characteristics of Magnetic Flux Concentrators Used in Tunneling Magnetoresistance Devices
Author
Bi Ran  VIAFID ORCID Logo  ; Zhang Huiquan; Pan, Shi; Liu Xinting; Chen, Ruiying  VIAFID ORCID Logo  ; Wu, Shilin  VIAFID ORCID Logo  ; Hu, Jun
First page
4739
Publication year
2025
Publication date
2025
Publisher
MDPI AG
e-ISSN
14248220
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
3239087131
Copyright
© 2025 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.