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The polarization switching pathway in HfxZr1-xO2-based ferroelectric thin film is still not well clarified and agreed, limiting the fundamental physical understanding and performance engineering. The key question lies in clarifying the transient intermediate state during the polarization switching of orthorhombic phase. In this work, by designing the ferroelectric and dielectric stacks, we theoretically and experimentally demonstrate a polarization switching pathway through an orthorhombic-tetragonal-orthorhombic phase transition in ferroelectric HfxZr1-xO2 where the non-polar tetragonal phase is metastable. Meanwhile, the phase transition pathway under electric field is experimentally demonstrated by in-situ grazing incidence X-ray diffraction measurement. Furthermore, by engineering the energy barrier of reversible orthorhombic-tetragonal phase transition through controlling the defects and interface properties, a low coercive field ~0.6 MV/cm and a low operation voltage <0.65 V is achieved in an 8 nm Hf0.5Zr0.5O2 film. Our results provide insights into the fundamental physics and performance engineering of ferroelectric HfxZr1-xO2 materials.
The authors demonstrate a polarization switching pathway through an orthorhombic-tetragonal orthorhombic phase transition in ferroelectric Hf0.5Zr0.5O2, where the intermediate state, non-polar P42/nmc T-phase, is metastable.
Details
; Dong, Yulong 1 ; Cui, Tianning 1 ; Xue, Zhipeng 1 ; Yao, Zikang 1 ; Gao, Qiang 1 ; Wang, Ruixue 2 ; Fan, Yuyan 1
; Liu, Jingquan 3
; Zhang, Xin 4 ; Wang, Zhen 5
; Li, Wenwu 2
; Chu, Junhao 2 ; Si, Mengwei 3
; Li, Xiuyan 3
1 National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai, China (ROR: https://ror.org/0220qvk04) (GRID: grid.16821.3c) (ISNI: 0000 0004 0368 8293); School of Integrated Circuits (School of Information Science and Electronic Engineering), Shanghai Jiao Tong University, Shanghai, China (ROR: https://ror.org/0220qvk04) (GRID: grid.16821.3c) (ISNI: 0000 0004 0368 8293)
2 Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai, China (ROR: https://ror.org/013q1eq08) (GRID: grid.8547.e) (ISNI: 0000 0001 0125 2443); State Key Laboratory of Photovoltaic Science and Technology, Department of Materials Science, College of Future Information Technology, Fudan University, Shanghai, China (ROR: https://ror.org/013q1eq08) (GRID: grid.8547.e) (ISNI: 0000 0001 0125 2443)
3 National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai, China (ROR: https://ror.org/0220qvk04) (GRID: grid.16821.3c) (ISNI: 0000 0004 0368 8293)
4 College of Materials Science and Engineering, Hunan University, Changsha, China (ROR: https://ror.org/05htk5m33) (GRID: grid.67293.39)
5 Department of Physics, University of Science and Technology of China, Hefei, Anhui, China (ROR: https://ror.org/04c4dkn09) (GRID: grid.59053.3a) (ISNI: 0000000121679639)