Full text

Turn on search term navigation

Copyright © 2014 Marie Veitmann et al. Marie Veitmann et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Studies of high temperature oxidation of polyethylene are not much present in the literature though it can really be a problem especially in polymer production and processing. This study aims to detect oxidation flaws in polyethylene and to determine their impact on polymer structure and properties. Besides, we suggest a method via PLS-regression to determine the degree of flaws that can occur during polymer processing due to oxidation. Several kinds of oxidation flaws were reproduced in laboratory at 150°C in an oven operating in air and Raman spectroscopy analysis was performed on each sample. Using statistical tools as chemometrics on these spectra, we have built a Partial Least Square (PLS) model able to predict the oxidation degree of flaws. Interpretation of the model construction and further characterization tests show that oxidation can be followed with the evolution of the crystalline carbon group and of the created carbonyl functions. Finally we suggest possible mechanisms which can explain the high temperature oxidation process in LPDE, and we link them to the modification of the material properties.

Details

Title
Understanding and Control of High Temperature Oxidation Flaws of Low-Density Poly(ethylene) with Raman Spectroscopy
Author
Veitmann, Marie; Jumeau, Richard; Bourson, Patrice; Ferriol, Michel; Lahure, François
Publication year
2014
Publication date
2014
Publisher
Hindawi Limited
ISSN
16879449
e-ISSN
16879457
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
1547920581
Copyright
Copyright © 2014 Marie Veitmann et al. Marie Veitmann et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.