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Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
Shih, Huan-yu; Lee, Wei-hao; Kao, Wei-chung; Chuang, Yung-chuan; Lin, Ray-ming
; et al.
Scientific Reports (Nature Publisher Group); London Vol. 7, (Jan 2017): 39717.
DOI:10.1038/srep39717
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