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Enhanced resistive switching characteristics in Pt/BaTiO3/ITO structures through insertion of HfO2:Al2O3 (HAO) dielectric thin layer
Silva, J P B; Faita, F L; Kamakshi, K; Sekhar, K C; Moreira, J Agostinho
; et al.
Scientific Reports (Nature Publisher Group); London Vol. 7, (Apr 2017): 46350.
DOI:10.1038/srep46350
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