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Abstract
Subject of research. This paper focuses on the study of temperature effect on the threshold intensity values for fluorescent mark recording as well as on the features and threshold intensity values for photosensitive material damage during nonlinear phototransformation of chromone derivatives by visible light. Method. Photosensitive chromone derivative compound embedded into polymethyl methacrylate (PMMA) polymer films with 20 μm thickness on the glass substrate were used as samples. Fluorescent marks were recorded by diode pumped passively Q-switched microchip Nd:YAG laser with the second harmonic generation. The wavelength of recording laser pulse was 532 nm, pulse duration was equal to 1 ns. Sample temperature was controlled by Peltier element and was changed in the range of 0–100 °C. Recorded fluorescent marks were registered using confocal laser scanning microscope. Main results. It was shown that cooling of the sample from 25 °C to 0 leads to decreasing of laser induced damage of the sample. Heating of the sample from 25 °C to 100 leads to the decreasing of the threshold intensity for nonlinear recording of fluorescent mark and corresponding efficiency increase of photoinduced transformation process at the fixed energy and duration of laser pulse. Practical relevance. Requirements for thermal stabilization system in the device for nonlinear optical archive information recording can be specified based on acquired results.
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