Abstract

Large-area manufacturing of flexible nanoscale electronics has long been sought by the printed electronics industry. However, the lack of a robust, reliable, high throughput and low-cost technique that is capable of delivering high-performance functional devices has hitherto hindered commercial exploitation. Herein we report on the extensive range of capabilities presented by adhesion lithography (a-Lith), an innovative patterning technique for the fabrication of coplanar nanogap electrodes with arbitrarily large aspect ratio. We use this technique to fabricate a plethora of nanoscale electronic devices based on symmetric and asymmetric coplanar electrodes separated by a nanogap < 15 nm. We show that functional devices including self-aligned-gate transistors, radio frequency diodes and rectifying circuits, multi-colour organic light-emitting nanodiodes and multilevel non-volatile memory devices, can be fabricated in a facile manner with minimum process complexity on a range of substrates. The compatibility of the formed nanogap electrodes with a wide range of solution processable semiconductors and substrate materials renders a-Lith highly attractive for the manufacturing of large-area nanoscale opto/electronics on arbitrary size and shape substrates.

Adhesion lithography enables coplanar nanogap electrode fabrication and allows for the realisation of nanoscale electronics manufacturing

A collaborative team led by Thomas Anthopoulos from King Abdullah University of Science and Technology demonstrated a novel method for patterning coplanar electrodes with inter-electrode distances of less than 15 nm and arbitrarily large aspect ratios. This facile manufacturing method, called adhesion lithography, was used to fabricate a series of functional nanoscale electronic devices on various substrates. These flexible electronic devices, which are technologically relevant, included self-aligned-gate transistors, radio frequency diodes and rectifying circuits, multi-colour organic light-emitting diodes and multilevel non-volatile memory devices. Given its versatility in the fabrication of functional electronic devices and its solution-processing compatibility with a range of semiconductors and substrate materials, adhesion lithography is an attractive processing method for the high-throughput manufacture of large-scale flexible electronics at the nanoscale.

Details

Title
Large-area plastic nanogap electronics enabled by adhesion lithography
Author
Semple, James 1 ; Georgiadou, Dimitra G 1   VIAFID ORCID Logo  ; Wyatt-Moon Gwenhivir 1 ; Yoon Minho 1 ; Akmaral, Seitkhan 2 ; Yengel Emre 2   VIAFID ORCID Logo  ; Rossbauer Stephan 1 ; Bottacchi Francesca 1 ; McLachlan, Martyn A 3 ; Bradley, Donal D, C 4   VIAFID ORCID Logo  ; Anthopoulos, Thomas D 5   VIAFID ORCID Logo 

 Imperial College London, Department of Physics & Centre for Plastic Electronics, London, UK (GRID:grid.7445.2) (ISNI:0000 0001 2113 8111) 
 King Abdullah University of Science and Technology (KAUST), Division of Physical Sciences and Engineering, Thuwal, Saudi Arabia (GRID:grid.45672.32) (ISNI:0000 0001 1926 5090) 
 Imperial College London, Exhibition Road, South Kensington, Department of Materials & Centre for Plastic Electronics, London, UK (GRID:grid.7445.2) (ISNI:0000 0001 2113 8111) 
 Oxford University, Departments of Engineering Science and Physics and Division of Mathematical, Physical and Life Sciences, Oxford, UK (GRID:grid.4991.5) (ISNI:0000 0004 1936 8948) 
 Imperial College London, Department of Physics & Centre for Plastic Electronics, London, UK (GRID:grid.7445.2) (ISNI:0000 0001 2113 8111); King Abdullah University of Science and Technology (KAUST), Division of Physical Sciences and Engineering, Thuwal, Saudi Arabia (GRID:grid.45672.32) (ISNI:0000 0001 1926 5090) 
Publication year
2018
Publication date
2018
Publisher
Nature Publishing Group
e-ISSN
23974621
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2389707375
Copyright
© The Author(s) 2018. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.