It appears you don't have support to open PDFs in this web browser. To view this file, Open with your PDF reader
Abstract
The Berry phase picture provides important insights into the electronic properties of condensed matter systems. The intrinsic anomalous Hall (AH) effect can be understood as the consequence of non-zero Berry curvature in momentum space. Here, we fabricate TI/magnetic TI heterostructures and find that the sign of the AH effect in the magnetic TI layer can be changed from being positive to negative with increasing the thickness of the top TI layer. Our first-principles calculations show that the built-in electric fields at the TI/magnetic TI interface influence the band structure of the magnetic TI layer, and thus lead to a reconstruction of the Berry curvature in the heterostructure samples. Based on the interface-induced AH effect with a negative sign in TI/V-doped TI bilayer structures, we create an artificial “topological Hall effect”-like feature in the Hall trace of the V-doped TI/TI/Cr-doped TI sandwich heterostructures. Our study provides a new route to create the Berry curvature change in magnetic topological materials that may lead to potential technological applications.
Berry curvature connects to exotic electronic phases hence it provides important insights to understand quantum materials. Here, the authors report sign change of the anomalous Hall effect resulted from Berry curvature change at the interface of a topological insulator/magnetic topological insulator heterostructure.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer
Details








1 The Pennsylvania State University, Department of Physics, University Park, USA (GRID:grid.29857.31) (ISNI:0000 0001 2097 4281); Chinese Academy of Sciences, Shenyang National Laboratory for Materials Science, Institute of Metal Research, Shenyang, China (GRID:grid.9227.e) (ISNI:0000000119573309); Harbin Institute of Technology, School of Material Science and Engineering, Shenzhen, China (GRID:grid.19373.3f) (ISNI:0000 0001 0193 3564)
2 Nanjing University, National Laboratory of Solid-State Microstructures, Collaborative Innovation Center of Advanced Microstructures, and School of Physics, Nanjing, China (GRID:grid.41156.37) (ISNI:0000 0001 2314 964X)
3 The Pennsylvania State University, Department of Physics, University Park, USA (GRID:grid.29857.31) (ISNI:0000 0001 2097 4281)
4 Chinese Academy of Sciences, Shenyang National Laboratory for Materials Science, Institute of Metal Research, Shenyang, China (GRID:grid.9227.e) (ISNI:0000000119573309)
5 Harbin Institute of Technology, School of Material Science and Engineering, Shenzhen, China (GRID:grid.19373.3f) (ISNI:0000 0001 0193 3564)