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Abstract
Highlights
Industrially viable bottom-up spray pyrolysis deposition technique was used to prepare the highly compact TiO2 film, which is a vital element for the multi-layer front contact.
The optimization of the front contact is presented by fabricating reproducible and efficient perovskite solar cells
Multi-layer front contact is applied to realize efficient perovskite single-junction and perovskite/perovskite tandem solar cells, where optics and electrical effects of solar cells are studied by optically coupled 3D electromagnetic simulations.
The photovoltaic performance of perovskite solar cells (PSCs) can be improved by utilizing efficient front contact. However, it has always been a significant challenge for fabricating high-quality, scalable, controllable, and cost-effective front contact. This study proposes a realistic multi-layer front contact design to realize efficient single-junction PSCs and perovskite/perovskite tandem solar cells (TSCs). As a critical part of the front contact, we prepared a highly compact titanium oxide (TiO2) film by industrially viable Spray Pyrolysis Deposition (SPD), which acts as a potential electron transport layer (ETL) for the fabrication of PSCs. Optimization and reproducibility of the TiO2 ETL were discreetly investigated while fabricating a set of planar PSCs. As the front contact has a significant influence on the optoelectronic properties of PSCs, hence, we investigated the optics and electrical effects of PSCs by three-dimensional (3D) finite-difference time-domain (FDTD) and finite element method (FEM) rigorous simulations. The investigation allows us to compare experimental results with the outcome from simulations. Furthermore, an optimized single-junction PSC is designed to enhance the energy conversion efficiency (ECE) by > 30% compared to the planar reference PSC. Finally, the study has been progressed to the realization of all-perovskite TSC that can reach the ECE, exceeding 30%. Detailed guidance for the completion of high-performance PSCs is provided.
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Details
1 Kanazawa University, Nanomaterials Research Institute (NanoMaRi), Kanazawa, Japan (GRID:grid.9707.9) (ISNI:0000 0001 2308 3329); Tokai University, Research Institute of Science and Technology, Hiratsuka, Japan (GRID:grid.265061.6) (ISNI:0000 0001 1516 6626)
2 The Hong Kong Polytechnic University, Department of Applied Physics and Materials Research Center, Kowloon, Hong Kong, P. R. China (GRID:grid.16890.36) (ISNI:0000 0004 1764 6123); City University of Hong Kong, Department of Materials Science and Engineering, Kowloon, Hong Kong, P. R. China (GRID:grid.35030.35) (ISNI:0000 0004 1792 6846)
3 Tokai University, Graduate School of Engineering, Hiratsuka, Japan (GRID:grid.265061.6) (ISNI:0000 0001 1516 6626)
4 The Hong Kong Polytechnic University, Department of Applied Physics and Materials Research Center, Kowloon, Hong Kong, P. R. China (GRID:grid.16890.36) (ISNI:0000 0004 1764 6123)
5 Waseda University, Department of Modern Mechanical Engineering, Shinjuku, Tokyo, Japan (GRID:grid.5290.e) (ISNI:0000 0004 1936 9975)
6 Tokai University, Department of Chemistry, School of Science, Hiratsuka, Japan (GRID:grid.265061.6) (ISNI:0000 0001 1516 6626)
7 Tokai University, Research Institute of Science and Technology, Hiratsuka, Japan (GRID:grid.265061.6) (ISNI:0000 0001 1516 6626); Tokai University, Graduate School of Engineering, Hiratsuka, Japan (GRID:grid.265061.6) (ISNI:0000 0001 1516 6626)
8 Stanford University, Geballe Laboratory for Advanced Materials, Department of Materials Science and Engineering, Stanford, USA (GRID:grid.168010.e) (ISNI:0000000419368956)
9 Solar Energy Research Institute, The National University of Malaysia, Bangi, Malaysia (GRID:grid.412113.4) (ISNI:0000 0004 1937 1557)
10 Kanazawa University, Nanomaterials Research Institute (NanoMaRi), Kanazawa, Japan (GRID:grid.9707.9) (ISNI:0000 0001 2308 3329); Queens University, Department of Physics, Engineering Physics and Astronomy, Kingston, Canada (GRID:grid.410356.5) (ISNI:0000 0004 1936 8331)
11 Kanazawa University, Nanomaterials Research Institute (NanoMaRi), Kanazawa, Japan (GRID:grid.9707.9) (ISNI:0000 0001 2308 3329)