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Copyright © 2021 Francesca A. Scaramuzzo et al. This is an open access article distributed under the Creative Commons Attribution License (the “License”), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License. https://creativecommons.org/licenses/by/4.0/

Abstract

Despite having properties often very different from the pure element, silicon derivatives (e.g., SiO2, SiC, and silanes) are widely exploited as well in a variety of fields, ranging from photonic to biomedicine. Besides the traditional applications, the wide spreading of nanostructures, with their enhanced and in some respect unexpected properties, is now opening new perspectives for the possible uses of silicon and its derivatives. Briefly, the authors were able to demonstrate that by optimizing the thermal annealing it is possible to obtain a vertically oriented NiSi phase allowing the formation of ohmic contacts; on the other hand, the horizontal-type NiSi phase obtainable at higher temperatures results in the degradation of ohmic behaviour. Besides the electronic field, silicon and its derivatives are now recognized as useful intermediates for surface functionalization, nanostructure synthesis, and decoration. [...]within the field of Si for energy production and storage, P.P. Prosini and coworkers developed an efficient synthetic strategy for Si nanowires to be used as anodes in lithium-ion batteries.

Details

Title
Cutting Edge Technologies by Silicon- and Silicon Oxide-Based Nanostructures
Author
Scaramuzzo, Francesca A 1   VIAFID ORCID Logo  ; González-Campo, Arántzazu 2   VIAFID ORCID Logo  ; Alessandro Dell’Era 1 

 Department of Fundamental and Applied Sciences for Engineering, Sapienza University, Rome, Italy 
 Institut de Ciencia de Materials de Barcelona (ICMAB-CSIC), Barcelona, Spain 
Publication year
2021
Publication date
2021
Publisher
John Wiley & Sons, Inc.
ISSN
16874110
e-ISSN
16874129
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2491753391
Copyright
Copyright © 2021 Francesca A. Scaramuzzo et al. This is an open access article distributed under the Creative Commons Attribution License (the “License”), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License. https://creativecommons.org/licenses/by/4.0/