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Abstract
Van der Waals (vdW) heterostructures, consisting of a variety of low-dimensional materials, have great potential use in the design of a wide range of functional devices thanks to their atomically thin body and strong electrostatic tunability. Here, we demonstrate multi-functional indium selenide (InSe)/black phosphorous (BP) heterostructures encapsulated by hexagonal boron nitride. At a positive drain bias (VD), applied on the BP while the InSe is grounded, our heterostructures show an intermediate gate voltage (VBG) regime where the current hardly changes, working as a ternary transistor. By contrast, at a negative VD, the device shows strong negative differential transconductance characteristics; the peak current increases up to ~5 μA and the peak-to-valley current ratio reaches 1600 at VD = −2 V. Four-terminal measurements were performed on each layer, allowing us to separate the contributions of contact resistances and channel resistance. Moreover, multiple devices with different device structures and contacts were investigated, providing insight into the operation principle and performance optimization. We systematically investigated the influence of contact resistances, heterojunction resistance, channel resistance, and the thickness of BP on the detailed operational characteristics at different VD and VBG regimes.
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Details
1 Gwangju Institute of Science and Technology (GIST), School of Materials Science and Engineering, Gwangju, Republic of Korea (GRID:grid.61221.36) (ISNI:0000 0001 1033 9831)
2 Chung-Ang University, Department of Physics, Seoul, Republic of Korea (GRID:grid.254224.7) (ISNI:0000 0001 0789 9563)
3 National Institute for Materials Science, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
4 Gwangju Institute of Science and Technology (GIST), School of Materials Science and Engineering, Gwangju, Republic of Korea (GRID:grid.61221.36) (ISNI:0000 0001 1033 9831); Pohang University of Science and Technology (POSTECH), Center for Semiconductor Technology Convergence (CSTC), Electrical Engineering, Pohang, Republic of Korea (GRID:grid.49100.3c) (ISNI:0000 0001 0742 4007)
5 Gwangju Institute of Science and Technology (GIST), School of Materials Science and Engineering, Gwangju, Republic of Korea (GRID:grid.61221.36) (ISNI:0000 0001 1033 9831); Korea Advanced Institute of Science and Technology (KAIST), School of Electrical Engineering, Daejeon, Republic of Korea (GRID:grid.37172.30) (ISNI:0000 0001 2292 0500)