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Abstract
Technological and structural aspects of the synthesis of nanoscale films by magnetron sputtering methods and ways for improving their uniformity and structural perfection are considered. Experimental results demonstrate that the proposed technological solution makes it possible to obtain high-quality coatings with almost complete absence of the droplet component.
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Details
1 Department of microelectronics and radio engineering, Saint Petersburg Electrotechnical University “LETI”, 197376, Saint Petersburg, Russia
2 Kotelnikov Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 125009, Moscow, Russia
3 Department of electronic instruments and devices, Saint Petersburg Electrotechnical University “LETI”, 197376, Saint Petersburg, Russia