It appears you don't have support to open PDFs in this web browser. To view this file, Open with your PDF reader
Abstract
Graphene nanogaps are considered as essential building blocks of two-dimensional electronic circuits, as they offer the possibility to interconnect a broad range of atomic-scale objects. Here we provide an insight into the microscopic processes taking place during the formation of graphene nanogaps through the detailed analysis of their low-frequency noise properties. Following the evolution of the noise level, we identify the fundamentally different regimes throughout the nanogap formation. By modeling the resistance and bias dependence of the noise, we resolve the major noise-generating processes: atomic-scale junction-width fluctuations in the nanojunction regime and sub-atomic gap-size fluctuations in the nanogap regime. As a milestone toward graphene-based atomic electronics, our results facilitate the automation of an optimized electrical breakdown protocol for high-yield graphene nanogap fabrication.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer
Details





1 Budapest University of Technology and Economics, Department of Physics, Budapest, Hungary (GRID:grid.6759.d) (ISNI:0000 0001 2180 0451); Institute of Technical Physics and Materials Science, Centre for Energy Research, Budapest, Hungary (GRID:grid.419116.a)
2 Budapest University of Technology and Economics, Department of Physics, Budapest, Hungary (GRID:grid.6759.d) (ISNI:0000 0001 2180 0451); MTA-BME Condensed Matter Research Group, Budapest, Hungary (GRID:grid.5018.c) (ISNI:0000 0001 2149 4407)
3 Budapest University of Technology and Economics, Department of Physics, Budapest, Hungary (GRID:grid.6759.d) (ISNI:0000 0001 2180 0451)
4 Empa, Swiss Federal Laboratories for Materials Science and Technology, Transport at Nanoscale Interfaces Laboratory, Dübendorf, Switzerland (GRID:grid.7354.5) (ISNI:0000 0001 2331 3059)
5 Budapest University of Technology and Economics, Department of Physics, Budapest, Hungary (GRID:grid.6759.d) (ISNI:0000 0001 2180 0451); Empa, Swiss Federal Laboratories for Materials Science and Technology, Transport at Nanoscale Interfaces Laboratory, Dübendorf, Switzerland (GRID:grid.7354.5) (ISNI:0000 0001 2331 3059)