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© 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

We studied the structural and morphological evolution of Rh clusters on an ordered ultrathin alumina film grown on NiAl(100) in annealing processes, under ultrahigh vacuum conditions and with various surface probe techniques. The Rh clusters, prepared on vapor deposition of Rh onto the alumina film at 300 K, had an fcc phase and grew in the (100) orientation; the annealing altered the cluster structure little—the lattice parameter decreased by a factor <2%—but the cluster morphology significantly. With elevated temperature, small clusters (diameter ≤1.5 nm) decreased little in size; in contrast, large clusters (diameter ≥2.0 nm) varied in a complex manner—their mean diameter decreased to about 1.5 nm on annealing to 450 K, despite their similar height, while it increased to above 2.0 nm at temperature ≥570 K. This atypical decrease in size was governed predominantly by energetics. Such a reduced size enhanced the total surface area as well as the reactivity of the clusters toward methanol decomposition, so increased the production of D2 (H2) and CO from decomposed methanol-d4 (or methanol). The result implies a higher temperature tolerance for Rh clusters on the alumina film and a practical approach to prepare small Rh clusters with high reactivity.

Details

Title
Investigation of Thermal Stability and Reactivity of Rh Nanoclusters on an Ultrathin Alumina Film
Author
Zhen-He Liao 1 ; Po-Wei Hsu 1 ; Ting-Chieh Hung 1 ; Liao, Guan-Jr 1 ; Zhao-Ying, Chern 2 ; Yu-Ling, Lai 3 ; Li-Chung, Yu 3 ; Yao-Jane Hsu 3 ; Jeng-Han, Wang 2 ; Chen, Peilong 1 ; Meng-Fan, Luo 1   VIAFID ORCID Logo 

 Department of Physics, National Central University, 300 Jhongda Road, Jhongli District, Taoyuan 32001, Taiwan 
 Department of Chemistry, National Taiwan Normal University, No. 88, Sec. 4, Ting-Chow Rd, Taipei 11677, Taiwan 
 National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu Science Park, Hsinchu 30076, Taiwan; [email protected] (Y.-L.L.); 
First page
971
Publication year
2019
Publication date
2019
Publisher
MDPI AG
e-ISSN
20734344
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2547526743
Copyright
© 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.