Abstract

The dependence of the carrier-induced degradation on the temperature and irradiance is studied. The stability of samples after accelerated degradation and regeneration at different temperature and irradiance are studied also. Minority carrier lifetime and normalized defect density are used to characterize the degradation and regeneration kinetics. The mechanism of temperature and irradiance on degradation is studied and discussed.

Details

Title
Carrier-Induced Degradation in Monocrystalline Silicon: Dependence on the Temperature and Irradiance
Author
Li, Hailing 1 ; Wang, Xinxin 2 ; Wang, Wenjing 1 

 The Key Laboratory of Solar Thermal Energy and Photovoltaic System, IEE-CAS, No. 6 Beiertiao Zhongguancun, Haidian District, Beijing, China; University of Chinese Academy of Sciences, No. 19 Yuquan Road, Shijingshan District, Beijing, China 
 The Key Laboratory of Solar Thermal Energy and Photovoltaic System, IEE-CAS, No. 6 Beiertiao Zhongguancun, Haidian District, Beijing, China 
Publication year
2020
Publication date
Mar 2020
Publisher
IOP Publishing
ISSN
17578981
e-ISSN
1757899X
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2562177517
Copyright
© 2020. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.