It appears you don't have support to open PDFs in this web browser. To view this file, Open with your PDF reader
Abstract
The paper studies the regularities of silicon coatings formation on a substrate of an alloy based on nickel titanium using the radio-frequency (RF) magnetron sputtering method. It is shown that the use of the RF magnetron sputtering method allows making a silicon coating with a thickness more than 6 μm. It is determined that treatment time has the main influence on the thickness of a coating. The magnitude of the RF-power level of magnetron sputtering has a smaller effect on the thickness of the emerging coating.
You have requested "on-the-fly" machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Show full disclaimer
Neither ProQuest nor its licensors make any representations or warranties with respect to the translations. The translations are automatically generated "AS IS" and "AS AVAILABLE" and are not retained in our systems. PROQUEST AND ITS LICENSORS SPECIFICALLY DISCLAIM ANY AND ALL EXPRESS OR IMPLIED WARRANTIES, INCLUDING WITHOUT LIMITATION, ANY WARRANTIES FOR AVAILABILITY, ACCURACY, TIMELINESS, COMPLETENESS, NON-INFRINGMENT, MERCHANTABILITY OR FITNESS FOR A PARTICULAR PURPOSE. Your use of the translations is subject to all use restrictions contained in your Electronic Products License Agreement and by using the translation functionality you agree to forgo any and all claims against ProQuest or its licensors for your use of the translation functionality and any output derived there from. Hide full disclaimer
Details
1 Institute of Strength Physics and Materials Science SB RAS, 2/4 Akademichesky Ave., Tomsk, 634055, Russia