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Abstract
For many attractive applications of single layer MoS2 such as in optoelectronics e.g., the sample is supported by a substrate. Its importance for the modification through ion irradiation is here experimentally investigated by the analysis of sputtered particle of MoS2 on SiO2 and Au substrates under highly charged ion irradiation. The velocity distribution of the sputtered atoms is less affected by the substrate using highly charged projectiles than using slightly charged ones. Furthermore, we can show that potential sputtering causes additional emission of particles with lower kinetic energy.
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Details
1 Fakultät für Physik and CENIDE, AG Schleberger, Universität Duisburg-Essen, 47057 Duisburg, Germany
2 Fakultät für Physik and CENIDE, AG Wucher, Universität Duisburg-Essen, 47057 Duisburg, Germany