Abstract

Fabrication of continuous ultra-thin (<10 nm) and ultra-smooth gold films on different substrates is reported. Using a variety of electrical, optical and structural characterization techniques, we show that monolayer MoS2 can be superior to more conventional adhesion/seeding layers as an optical substrate for realizing ultra-thin gold films. Our results show that optical losses in ultrathin gold films increase with decreasing thickness due to the fine-grained structure and the presence of a small number of voids, however, they exhibit metallic properties down to a thickness of 3-4 nm.

Details

Title
Ultra-thin gold films: towards 2D metals for photonic and optoelectronic applications
Author
Volkov, V S 1 ; Yakubovsky, D I 2 ; Stebunov, Y V 3 ; Kirtaev, R V 2 ; Ermolaev, G A 4 ; Mironov, M S 2 ; Novikov, S M 2 ; Voronin, K V 2 ; Arsenin, A V 3 

 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia; GrapheneTek, 7 Nobel Street, Skolkovo Innovation Center, 143026, Russia; SDU Nano Optics, Mads Clausen Institute, University of Southern Denmark, Campusvej 55, DK-5230, Odense, Denmark 
 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia 
 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia; GrapheneTek, 7 Nobel Street, Skolkovo Innovation Center, 143026, Russia 
 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia; Skolkovo Institute of Science and Technology, Bolshoy Boulevard 30, bld. 1, 121205, Moscow, Russia 
Publication year
2020
Publication date
Mar 2020
Publisher
IOP Publishing
ISSN
17426588
e-ISSN
17426596
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2569109912
Copyright
© 2020. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.