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Abstract
Fabrication of continuous ultra-thin (<10 nm) and ultra-smooth gold films on different substrates is reported. Using a variety of electrical, optical and structural characterization techniques, we show that monolayer MoS2 can be superior to more conventional adhesion/seeding layers as an optical substrate for realizing ultra-thin gold films. Our results show that optical losses in ultrathin gold films increase with decreasing thickness due to the fine-grained structure and the presence of a small number of voids, however, they exhibit metallic properties down to a thickness of 3-4 nm.
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Details
1 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia; GrapheneTek, 7 Nobel Street, Skolkovo Innovation Center, 143026, Russia; SDU Nano Optics, Mads Clausen Institute, University of Southern Denmark, Campusvej 55, DK-5230, Odense, Denmark
2 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia
3 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia; GrapheneTek, 7 Nobel Street, Skolkovo Innovation Center, 143026, Russia
4 Moscow Institute of Physics and Technology, Institutskyi 9, 141700 Dolgoprudnyi, Russia; Skolkovo Institute of Science and Technology, Bolshoy Boulevard 30, bld. 1, 121205, Moscow, Russia