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Abstract
Monolayer transition-metal dichalcogenides (TMDCs) show a wealth of exciton physics. Here, we report the existence of a new excitonic species, the high-lying exciton (HX), in single-layer WSe2 with an energy of ~3.4 eV, almost twice the band-edge A-exciton energy, with a linewidth as narrow as 5.8 meV. The HX is populated through momentum-selective optical excitation in the K-valleys and is identified in upconverted photoluminescence (UPL) in the UV spectral region. Strong electron-phonon coupling results in a cascaded phonon progression with equidistant peaks in the luminescence spectrum, resolvable to ninth order. Ab initio GW-BSE calculations with full electron-hole correlations explain HX formation and unmask the admixture of upper conduction-band states to this complex many-body excitation. These calculations suggest that the HX is comprised of electrons of negative mass. The coincidence of such high-lying excitonic species at around twice the energy of band-edge excitons rationalizes the excitonic quantum-interference phenomenon recently discovered in optical second-harmonic generation (SHG) and explains the efficient Auger-like annihilation of band-edge excitons.
Here, the authors report on evidence of an excitonic species formed by electrons in high-energy conduction band states with a negative effective mass, explaining previous observations of quantum interference phenomena in two-dimensional semiconductors.
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1 University of Regensburg, Department of Physics, Regensburg, Germany (GRID:grid.7727.5) (ISNI:0000 0001 2190 5763)
2 University of California at Berkeley, Department of Physics, Berkeley, USA (GRID:grid.47840.3f) (ISNI:0000 0001 2181 7878); Lawrence Berkeley National Laboratory, Materials Sciences Division, Berkeley, USA (GRID:grid.184769.5) (ISNI:0000 0001 2231 4551)
3 University of Cambridge, Cavendish Laboratory, Cambridge, UK (GRID:grid.5335.0) (ISNI:0000000121885934)
4 National Institute for Materials Science, Research Center for Functional Materials, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
5 National Institute for Materials Science, International Center for Materials Nanoarchitectonics, Tsukuba, Japan (GRID:grid.21941.3f) (ISNI:0000 0001 0789 6880)
6 University of Cambridge, Cavendish Laboratory, Cambridge, UK (GRID:grid.5335.0) (ISNI:0000000121885934); University of Cambridge, Department of Materials Science and Metallurgy, Cambridge, UK (GRID:grid.5335.0) (ISNI:0000000121885934)
7 University of Regensburg, Department of Physics, Regensburg, Germany (GRID:grid.7727.5) (ISNI:0000 0001 2190 5763); Technische Universität Dresden, Dresden Integrated Center for Applied Physics and Photonic Materials (IAPP) and Würzburg-Dresden Cluster of Excellence ct.qmat, Dresden, Germany (GRID:grid.4488.0) (ISNI:0000 0001 2111 7257)
8 University of California at Berkeley, Department of Physics, Berkeley, USA (GRID:grid.47840.3f) (ISNI:0000 0001 2181 7878); Lawrence Berkeley National Laboratory, Materials Sciences Division, Berkeley, USA (GRID:grid.184769.5) (ISNI:0000 0001 2231 4551); Yale University, Department of Mechanical Engineering and Materials Science, Yale, USA (GRID:grid.47100.32) (ISNI:0000000419368710)