Abstract

We report original method of formation Ga(In)N/AlN quantum dots with low density by ammonia MBE on the (0001)AlN surface by using a decomposition process of Ga(In)N thin layer. Low density of quantum dots have been obtained in the range 107-109 cm-2. Single quantum dots photoluminescence lines corresponding to exciton and biexciton transitions were observed in micro-photoluminescence spectra.

Details

Title
Original method of GaN and InGaN quantum dots formation on (0001)AlN surface by ammonia molecular beam epitaxy
Author
Zhuravlev, K S 1 ; Gulyaev, D V 1 ; Aleksandrov, I A 1 ; Malin, T V 1 ; Mansurov, V G 1 ; Galitsyn, Yu G 1 ; Konfederatova, KA 1 ; Yen-Chun, Chen 2 ; Wen-Hao, Chang 2 

 Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Siences, Novosibirsk 630090, Russia 
 Department of Electrophysics, National Chiao Tung University, Hsinchu 30010, Taiwan 
Publication year
2017
Publication date
Jun 2017
Publisher
IOP Publishing
ISSN
17426588
e-ISSN
17426596
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2574646466
Copyright
© 2017. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.