Abstract

Band gap engineering in ZnO thin films have been subject of intensive studies. The thin films of 2 wt % Fe and 2 wt % Ga doped ZnO and undoped ZnO were deposited on glass substrate by pulse laser deposition technique. Structural, optical and electronic structure properties of these thin films were investigated by X- Ray diffraction (XRD), UV-Vis spectroscopy and X-ray absorption spectroscopy (XAS), respectively. XRD studies show that all the thin films are highly oriented along the c-axis and maintain the wurtzite structure. Out of plane lattice parameter in Ga doped is smaller while in Fe doped is larger, compared to undoped ZnO. The band gaps of doped films have been found to increase due to doping of the Ga and Fe ions. XAS studies across O K edges of doped thin films show that the conduction band edge structure probed via oxygen 1s to 2p transitions have modified significantly in Ga doped sample.

Details

Title
Structural optical and electronic properties of Fe and Ga doped ZnO thin films grown using pulsed laser deposition technique
Author
Singh, Karmvir 1 ; Shukla, D K 2 ; Majid, S 3 ; Dhar, R 1 ; Choudhary, R J 2 ; Phase, D M 2 

 Department of Applied Physics, Guru Jambheshwar University of Science and Technology, Hisar, Haryana, India 
 UGC-DAE Consortium for Scientific Research, Indore-452001 
 India department of Physics, Aligarh Muslim University, Aligarh 202002, India 
Publication year
2016
Publication date
Oct 2016
Publisher
IOP Publishing
ISSN
17426588
e-ISSN
17426596
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2575238862
Copyright
© 2016. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.