Abstract

Photoluminescence (PL) properties of undoped InAs autoepitaxial layers are studied at various temperatures (9-120 K) and excitation power density (0.2-12.5 W/cm2). The studied structures have been grown on highly doped n++-InAs substrates by chloride-hydride vapour phase epitaxy method. PL spectra measurements were carried out with an FTIR spectrometer. The samples exhibit several luminescence peaks in the 2.9-3.3 μm range, which are attributed to free exciton transitions, deep donor bound excitons, and donor-acceptor pairs. A correlation is revealed between the PL intensity, and the background doping level of InAs epilayers – as supported by the free carrier concentration and mobility measurements, as well as SIMS data. A decrease of donor-bound exciton PL peak is observed for InAs sulfidized by Na2S.

Details

Title
Photoluminescence of undoped InAs autoepitaxial layers
Author
Firsov, D D 1 ; Komkov, O S 1 ; Petrov, A S 2 

 Micro- and Nanoelectronics department, St. Petersburg Electrotechnical University “LETI”, Professora Popova street 5, St. Petersburg 197376, Russia 
 OJSC NRI “Electron”, Toreza ave. 68, St. Petersburg 194223, Russia 
Publication year
2015
Publication date
Nov 2015
Publisher
IOP Publishing
ISSN
17426588
e-ISSN
17426596
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2576460543
Copyright
© 2015. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.