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Abstract
Solution-processed metal halide perovskites have been recognized as one of the most promising semiconductors, with applications in light-emitting diodes (LEDs), solar cells and lasers. Various additives have been widely used in perovskite precursor solutions, aiming to improve the formed perovskite film quality through passivating defects and controlling the crystallinity. The additive’s role of defect passivation has been intensively investigated, while a deep understanding of how additives influence the crystallization process of perovskites is lacking. Here, we reveal a general additive-assisted crystal formation pathway for FAPbI3 perovskite with vertical orientation, by tracking the chemical interaction in the precursor solution and crystallographic evolution during the film formation process. The resulting understanding motivates us to use a new additive with multi-functional groups, 2-(2-(2-Aminoethoxy)ethoxy)acetic acid, which can facilitate the orientated growth of perovskite and passivate defects, leading to perovskite layer with high crystallinity and low defect density and thereby record-high performance NIR perovskite LEDs (~800 nm emission peak, a peak external quantum efficiency of 22.2% with enhanced stability).
Additives have been widely used for passivating defects in perovskite semiconductors, yet the role of additive and their interaction is not clear. Here, the authors reveal an additive-assisted crystal formation in FAPbI3 perovskite by tracking the chemical interaction in the precursor solution and crystallographic evolution using multi-functional additives.
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1 Nanjing Tech University (NanjingTech), Key Laboratory of Flexible Electronics (KLOFE) & Institute of Advanced Materials (IAM), Nanjing, China (GRID:grid.412022.7) (ISNI:0000 0000 9389 5210)
2 Northwestern Polytechnical University (NPU), Shaanxi Institute of Flexible Electronics (SIFE), Xi’an, China (GRID:grid.440588.5) (ISNI:0000 0001 0307 1240)
3 The Chinese University of Hong Kong, Department of Physics, Shatin, Hong Kong (GRID:grid.10784.3a) (ISNI:0000 0004 1937 0482)
4 Nanjing Tech University (NanjingTech), Key Laboratory of Flexible Electronics (KLOFE) & Institute of Advanced Materials (IAM), Nanjing, China (GRID:grid.412022.7) (ISNI:0000 0000 9389 5210); Northwestern Polytechnical University (NPU), Shaanxi Institute of Flexible Electronics (SIFE), Xi’an, China (GRID:grid.440588.5) (ISNI:0000 0001 0307 1240)